Inventor
OGATA HIROTO
JP24 patents
⚠️ This page may combine multiple inventors who share the name “OGATA HIROTO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NISSAN CHEMICAL CORP
17 patentsUS11112696B2Sep 7, 2021
Protective film-forming composition
NISSAN CHEMICAL CORP2 citations71
US12386262B2Aug 12, 2025
Resist underlayer film-forming composition using carbon-oxygen double bond
NISSAN CHEMICAL CORP0 citations62
US12215259B2Feb 4, 2025
Multilayer object and release agent composition
NISSAN CHEMICAL CORP0 citations62
US12044969B2Jul 23, 2024
Resist underlayer film-forming composition
NISSAN CHEMICAL CORP0 citations62
US11635692B2Apr 25, 2023
Resist underlying film forming composition
NISSAN CHEMICAL CORP0 citations62
US11319514B2May 3, 2022
Composition for forming a coating film for removing foreign matters
NISSAN CHEMICAL CORP0 citations62
US11003078B2May 11, 2021
Compositions for forming a protective film against basic aqueous hydrogen peroxide solution, and pattern formation method
NISSAN CHEMICAL CORP1 citations61
US12534693B2Jan 27, 2026
Semiconductor substrate cleaning method, processed semiconductor substrate manufacturing method, and composition for peeling
NISSAN CHEMICAL CORP0 citations60
US12529018B2Jan 20, 2026
Method for cleaning semiconductor substrate, method for producing processed semiconductor substrate, and stripping composition
NISSAN CHEMICAL CORP0 citations60
US12297381B2May 13, 2025
Laminate, release agent composition, and method for manufacturing processed semiconductor substrate
NISSAN CHEMICAL CORP0 citations58
US12072630B2Aug 27, 2024
Resist underlayer film-forming composition including cyclic carbonyl compound
NISSAN CHEMICAL CORP0 citations51
US11674051B2Jun 13, 2023
Stepped substrate coating composition containing compound having curable functional group
NISSAN CHEMICAL CORP0 citations51
US11287741B2Mar 29, 2022
Resist underlayer film-forming composition
NISSAN CHEMICAL CORP0 citations51
US11131928B2Sep 28, 2021
Resist underlayer film forming composition which contains compound having glycoluril skeleton as additive
NISSAN CHEMICAL CORP0 citations51
US12545863B2Feb 10, 2026
Method for cleaning semiconductor substrate, method for producing processed semiconductor substrate, and stripping composition
NISSAN CHEMICAL CORP0 citations50
US12332566B2Jun 17, 2025
Resist underlayer film-forming composition
NISSAN CHEMICAL CORP0 citations48
US12313972B2May 27, 2025
Resist underlayer film-forming composition
NISSAN CHEMICAL CORP0 citations46
NISSAN CHEMICAL IND LTD
6 patentsUS9793131B2Oct 17, 2017
Pattern forming method using resist underlayer film
NISSAN CHEMICAL IND LTD2 citations72
US11542366B2Jan 3, 2023
Composition for forming resist underlayer film and method for forming resist pattern using same
NISSAN CHEMICAL IND LTD0 citations62
US10437151B2Oct 8, 2019
Cationically polymerizable resist underlayer film-forming composition
NISSAN CHEMICAL IND LTD1 citations62
US10844167B2Nov 24, 2020
Composition for forming resist underlayer film and method for forming resist pattern using same
NISSAN CHEMICAL IND LTD0 citations51
US9678427B2Jun 13, 2017
Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chain
NISSAN CHEMICAL IND LTD1 citations51
US9534140B2Jan 3, 2017
Resist underlayer film-forming composition
NISSAN CHEMICAL IND LTD0 citations51