Inventor
VAZAN FRIDRICH
US38 patents
⚠️ This page may combine multiple inventors who share the name “VAZAN FRIDRICH”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
EASTMAN KODAK CO
22 patentsUS6688365B2Feb 10, 2004
Method for transferring of organic material from a donor to form a layer in an OLED device
EASTMAN KODAK CO31 citations92
US6365256B1Apr 2, 2002
Erasable phase change optical recording elements
EASTMAN KODAK CO35 citations92
US5077181ADec 31, 1991
Optical recording materials comprising antimony-tin alloys including a third element
EASTMAN KODAK CO23 citations92
US4981772AJan 1, 1991
Optical recording materials comprising antimony-tin alloys including a third element
EASTMAN KODAK CO25 citations92
US4798785AJan 17, 1989
Recording elements comprising write-once thin film alloy layers
EASTMAN KODAK CO40 citations92
US5271978ADec 21, 1993
Optical recording media
EASTMAN KODAK CO48 citations90
US5972458AOct 26, 1999
Optical recording element with an interfacial layer between the recording layer and the reflecting layer
EASTMAN KODAK CO18 citations84
US6605330B2Aug 12, 2003
Phase-change recording element for write once applications
EASTMAN KODAK CO17 citations83
US4865955ASep 12, 1989
Recording elements comprising write-once thin film alloy layers
EASTMAN KODAK CO21 citations82
US6790594B1Sep 14, 2004
High absorption donor substrate coatable with organic layer(s) transferrable in response to incident laser light
EASTMAN KODAK CO8 citations74
US5585158ADec 17, 1996
Recordable optical element using low absorption materials
EASTMAN KODAK CO9 citations74
US6544617B1Apr 8, 2003
Phase-change recording element for write once applications
EASTMAN KODAK CO10 citations73
US6497988B2Dec 24, 2002
Phase-change recording element for write once applications
EASTMAN KODAK CO7 citations73
US5733623AMar 31, 1998
Recording media for recordable element
EASTMAN KODAK CO14 citations73
US4797871AJan 10, 1989
Erasable optical recording method
EASTMAN KODAK CO9 citations71
US5770293AJun 23, 1998
Method of forming recordable optical element using low absorption materials
EASTMAN KODAK CO3 citations63
US5015548AMay 14, 1991
Erasable phase change optical recording elements and methods
EASTMAN KODAK CO5 citations63
US5843553ADec 1, 1998
High performance media for optical recording
EASTMAN KODAK CO3 citations62
US6224960B1May 1, 2001
Phase-change recording medium for write once applications
EASTMAN KODAK CO5 citations61
US5196294AMar 23, 1993
Erasable optical recording materials and methods based on tellurium alloys
EASTMAN KODAK CO3 citations60
US5725741AMar 10, 1998
Method of forming recordable optical element using low absorption materials
EASTMAN KODAK CO1 citations52
US5196284AMar 23, 1993
Erasable phase change optical recording elements and methods
EASTMAN KODAK CO1 citations52
EMAGIN CORP
13 patentsUS11905590B2Feb 20, 2024
Direct-deposition system including standoffs for controlling substrate-mask separation
EMAGIN CORP2 citations71
US11275315B2Mar 15, 2022
High-precision shadow-mask-deposition system and method therefor
EMAGIN CORP2 citations71
US11152573B2Oct 19, 2021
Shadow mask comprising a gravity-compensation layer and method of fabrication
EMAGIN CORP2 citations71
US10636969B2Apr 28, 2020
Apparatus and method of directly patterning high resolution active matrix organic light emitting diodes using high-resolution shadow mask
EMAGIN CORP4 citations71
US10072328B2Sep 11, 2018
High-precision shadow-mask-deposition system and method therefor
EMAGIN CORP3 citations71
US10644239B2May 5, 2020
High precision, high resolution collimating shadow mask and method for fabricating a micro-display
EMAGIN CORP4 citations68
US10147906B2Dec 4, 2018
High efficacy seal for organic light emitting diode displays
EMAGIN CORP2 citations68
US11313033B2Apr 26, 2022
Linear source apparatus, system and method of use
EMAGIN CORP0 citations61
US11035033B2Jun 15, 2021
Direct-deposition system including standoffs for controlling substrate-mask separation
EMAGIN CORP1 citations61
US10386731B2Aug 20, 2019
Shadow-mask-deposition system and method therefor
EMAGIN CORP1 citations61
US11121321B2Sep 14, 2021
High resolution shadow mask with tapered pixel openings
EMAGIN CORP0 citations51
US10815563B2Oct 27, 2020
Linear source apparatus, system and method of use
EMAGIN CORP0 citations50
US10522794B2Dec 31, 2019
Method of active alignment for direct patterning high resolution micro-display
EMAGIN CORP0 citations40