P

Inventor

LEOMANT SYLVAIN

AT21 patents
⚠️ This page may combine multiple inventors who share the name “LEOMANT SYLVAIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

INFINEON TECHNOLOGIES AUSTRIA AG

19 patents
US10573742B1Feb 25, 2020

Oxygen inserted Si-layers in vertical trench power devices

INFINEON TECHNOLOGIES AUSTRIA AG11 citations85
US10580888B1Mar 3, 2020

Oxygen inserted Si-layers for reduced contact implant outdiffusion in vertical power devices

INFINEON TECHNOLOGIES AUSTRIA AG7 citations84
US10510836B1Dec 17, 2019

Gate trench device with oxygen inserted si-layers

INFINEON TECHNOLOGIES AUSTRIA AG13 citations84
US11031466B2Jun 8, 2021

Method of forming oxygen inserted Si-layers in power semiconductor devices

INFINEON TECHNOLOGIES AUSTRIA AG2 citations73
US10861966B2Dec 8, 2020

Vertical trench power devices with oxygen inserted Si-layers

INFINEON TECHNOLOGIES AUSTRIA AG3 citations73
US10741638B2Aug 11, 2020

Oxygen inserted Si-layers for reduced substrate dopant outdiffusion in power devices

INFINEON TECHNOLOGIES AUSTRIA AG4 citations73
US11581369B2Feb 14, 2023

Semiconductor switch element and method of manufacturing the same

INFINEON TECHNOLOGIES AUSTRIA AG2 citations70
US11682704B2Jun 20, 2023

Method of producing a semiconductor device

INFINEON TECHNOLOGIES AUSTRIA AG0 citations62
US11545545B2Jan 3, 2023

Superjunction device with oxygen inserted Si-layers

INFINEON TECHNOLOGIES AUSTRIA AG0 citations62
US11316020B2Apr 26, 2022

Semiconductor device and method

INFINEON TECHNOLOGIES AUSTRIA AG0 citations62
US11031479B2Jun 8, 2021

Semiconductor device with different gate trenches

INFINEON TECHNOLOGIES AUSTRIA AG0 citations61
US10418452B2Sep 17, 2019

Semiconductor device with different gate trenches

INFINEON TECHNOLOGIES AUSTRIA AG1 citations61
US12159933B2Dec 3, 2024

Semiconductor device with semiconductor mesas between adjacent gate trenches

INFINEON TECHNOLOGIES AUSTRIA AG0 citations57
US11908904B2Feb 20, 2024

Planar gate semiconductor device with oxygen-doped Si-layers

INFINEON TECHNOLOGIES AUSTRIA AG0 citations57
US11777026B2Oct 3, 2023

Power semiconductor device having low-k dielectric gaps between adjacent metal contacts

INFINEON TECHNOLOGIES AUSTRIA AG0 citations57
US10868172B2Dec 15, 2020

Vertical power devices with oxygen inserted Si-layers

INFINEON TECHNOLOGIES AUSTRIA AG0 citations52
US10790353B2Sep 29, 2020

Semiconductor device with superjunction and oxygen inserted Si-layers

INFINEON TECHNOLOGIES AUSTRIA AG0 citations51
US9530773B2Dec 27, 2016

Systems and methods for integrating bootstrap circuit elements in power transistors and other devices

INFINEON TECHNOLOGIES AUSTRIA AG0 citations51
US9941354B2Apr 10, 2018

Semiconductor device comprising a first gate trench and a second gate trench

INFINEON TECHNOLOGIES AUSTRIA AG0 citations50

ATMEL CORP

1 patent

INFINEON TECHNOLOGIES AUSTRIA

1 patent