Inventor
LEOMANT SYLVAIN
AT21 patents
⚠️ This page may combine multiple inventors who share the name “LEOMANT SYLVAIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
INFINEON TECHNOLOGIES AUSTRIA AG
19 patentsUS10573742B1Feb 25, 2020
Oxygen inserted Si-layers in vertical trench power devices
INFINEON TECHNOLOGIES AUSTRIA AG11 citations85
US10580888B1Mar 3, 2020
Oxygen inserted Si-layers for reduced contact implant outdiffusion in vertical power devices
INFINEON TECHNOLOGIES AUSTRIA AG7 citations84
US10510836B1Dec 17, 2019
Gate trench device with oxygen inserted si-layers
INFINEON TECHNOLOGIES AUSTRIA AG13 citations84
US11031466B2Jun 8, 2021
Method of forming oxygen inserted Si-layers in power semiconductor devices
INFINEON TECHNOLOGIES AUSTRIA AG2 citations73
US10861966B2Dec 8, 2020
Vertical trench power devices with oxygen inserted Si-layers
INFINEON TECHNOLOGIES AUSTRIA AG3 citations73
US10741638B2Aug 11, 2020
Oxygen inserted Si-layers for reduced substrate dopant outdiffusion in power devices
INFINEON TECHNOLOGIES AUSTRIA AG4 citations73
US11581369B2Feb 14, 2023
Semiconductor switch element and method of manufacturing the same
INFINEON TECHNOLOGIES AUSTRIA AG2 citations70
US11682704B2Jun 20, 2023
Method of producing a semiconductor device
INFINEON TECHNOLOGIES AUSTRIA AG0 citations62
US11545545B2Jan 3, 2023
Superjunction device with oxygen inserted Si-layers
INFINEON TECHNOLOGIES AUSTRIA AG0 citations62
US11316020B2Apr 26, 2022
Semiconductor device and method
INFINEON TECHNOLOGIES AUSTRIA AG0 citations62
US11031479B2Jun 8, 2021
Semiconductor device with different gate trenches
INFINEON TECHNOLOGIES AUSTRIA AG0 citations61
US10418452B2Sep 17, 2019
Semiconductor device with different gate trenches
INFINEON TECHNOLOGIES AUSTRIA AG1 citations61
US12159933B2Dec 3, 2024
Semiconductor device with semiconductor mesas between adjacent gate trenches
INFINEON TECHNOLOGIES AUSTRIA AG0 citations57
US11908904B2Feb 20, 2024
Planar gate semiconductor device with oxygen-doped Si-layers
INFINEON TECHNOLOGIES AUSTRIA AG0 citations57
US11777026B2Oct 3, 2023
Power semiconductor device having low-k dielectric gaps between adjacent metal contacts
INFINEON TECHNOLOGIES AUSTRIA AG0 citations57
US10868172B2Dec 15, 2020
Vertical power devices with oxygen inserted Si-layers
INFINEON TECHNOLOGIES AUSTRIA AG0 citations52
US10790353B2Sep 29, 2020
Semiconductor device with superjunction and oxygen inserted Si-layers
INFINEON TECHNOLOGIES AUSTRIA AG0 citations51
US9530773B2Dec 27, 2016
Systems and methods for integrating bootstrap circuit elements in power transistors and other devices
INFINEON TECHNOLOGIES AUSTRIA AG0 citations51
US9941354B2Apr 10, 2018
Semiconductor device comprising a first gate trench and a second gate trench
INFINEON TECHNOLOGIES AUSTRIA AG0 citations50