P

Inventor

YUN CHEOL-JU

KR28 patents

Patents

28 patents
US7488644B2Feb 10, 2009

Method of fabricating a semiconductor device

SAMSUNG ELECTRONICS CO LTD20 citations92
US7056786B2Jun 6, 2006

Self-aligned buried contact pair and method of forming the same

SAMSUNG ELECTRONICS CO LTD20 citations92
US7326613B2Feb 5, 2008

Methods of manufacturing semiconductor devices having elongated contact plugs

SAMSUNG ELECTRONICS CO LTD9 citations84
US7247541B2Jul 24, 2007

Method of manufacturing a semiconductor memory device including a transistor

SAMSUNG ELECTRONICS CO LTD12 citations84
US7205232B2Apr 17, 2007

Method of forming a self-aligned contact structure using a sacrificial mask layer

SAMSUNG ELECTRONICS CO LTD13 citations84
US7078292B2Jul 18, 2006

Storage node contact forming method and structure for use in semiconductor memory

SAMSUNG ELECTRONICS CO LTD20 citations84
US7026246B2Apr 11, 2006

Method of cleaning semiconductor substrates after forming tungsten patterns

SAMSUNG ELECTRONICS CO LTD15 citations84
US6967150B2Nov 22, 2005

Method of forming self-aligned contact in fabricating semiconductor device

SAMSUNG ELECTRONICS CO LTD16 citations84
US6916738B2Jul 12, 2005

Semiconductor device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD13 citations84
US7321146B2Jan 22, 2008

DRAM memory cell and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD11 citations83
US7030439B2Apr 18, 2006

DRAM memory cell and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD11 citations83
US9184091B2Nov 10, 2015

Semiconductor device and method of forming the same

SAMSUNG ELECTRONICS CO LTD14 citations82
US8987860B2Mar 24, 2015

Semiconductor device

SAMSUNG ELECTRONICS CO LTD10 citations81
US7388243B2Jun 17, 2008

Self-Aligned buried contact pair

SAMSUNG ELECTRONICS CO LTD8 citations74
US7180118B2Feb 20, 2007

Semiconductor device including storage node and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD7 citations74
US6773338B2Aug 10, 2004

Polishing head and chemical mechanical polishing apparatus including the same

SAMSUNG ELECTRONICS CO LTD7 citations74
US8946077B2Feb 3, 2015

Method of manufacturing a semiconductor device

SAMSUNG ELECTRONICS CO LTD6 citations71
US7557410B2Jul 7, 2009

Dynamic random access memory device

SAMSUNG ELECTRONICS CO LTD2 citations63
US7547938B2Jun 16, 2009

Semiconductor devices having elongated contact plugs

SAMSUNG ELECTRONICS CO LTD3 citations63
US7482222B2Jan 27, 2009

Semiconductor device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD4 citations63
US7476585B2Jan 13, 2009

Semiconductor device including storage node and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD3 citations63
US7307305B2Dec 11, 2007

Semiconductor device

SAMSUNG ELECTRONICS CO LTD4 citations63
US7691719B2Apr 6, 2010

Semiconductor device having storage nodes and its method of fabrication

SAMSUNG ELECTRONICS CO LTD2 citations62
US6635582B2Oct 21, 2003

Method of manufacturing semiconductor device

SAMSUNG ELECTRONICS CO LTD6 citations62
US12211891B2Jan 28, 2025

Semiconductor devices

SAMSUNG ELECTRONICS CO LTD0 citations59
US12356610B2Jul 8, 2025

Semiconductor device

SAMSUNG ELECTRONICS CO LTD0 citations52
US7166507B2Jan 23, 2007

Semiconductor device and method for forming same using multi-layered hard mask

SAMSUNG ELECTRONICS CO LTD1 citations52
US9343355B2May 17, 2016

Wiring structures including spacers and an airgap defined thereby, and methods of manufacturing the same

SAMSUNG ELECTRONICS CO LTD1 citations49