Inventor
IKEGAWA HIROAKI
JP18 patents
Patents
18 patentsUS9640448B2May 2, 2017
Film forming method, film forming apparatus, and storage medium
TOKYO ELECTRON LTD463 citations96
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Heat treatment process for wafers
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US9136133B2Sep 15, 2015
Method of depositing film
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US8962495B2Feb 24, 2015
Film deposition method
TOKYO ELECTRON LTD9 citations81
US10438791B2Oct 8, 2019
Film forming method, film forming apparatus, and storage medium
TOKYO ELECTRON LTD2 citations71
US10550467B2Feb 4, 2020
Film formation apparatus
TOKYO ELECTRON LTD1 citations62
US10900121B2Jan 26, 2021
Method of manufacturing semiconductor device and apparatus of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations61
US9252043B2Feb 2, 2016
Film deposition method
TOKYO ELECTRON LTD2 citations61
US8987147B2Mar 24, 2015
Method of depositing a film using a turntable apparatus
TOKYO ELECTRON LTD3 citations61
US8895456B2Nov 25, 2014
Method of depositing a film
TOKYO ELECTRON LTD2 citations61
US7084023B2Aug 1, 2006
Method of manufacturing semiconductor device, film-forming apparatus, and storage medium
TOKYO ELECTRON LTD5 citations61
US12334380B2Jun 17, 2025
Boat transfer method and heat treatment apparatus
TOKYO ELECTRON LTD0 citations55
US11171014B2Nov 9, 2021
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations50
US8921237B2Dec 30, 2014
Method of depositing a film
TOKYO ELECTRON LTD0 citations50
US10519550B2Dec 31, 2019
Film formation apparatus
TOKYO ELECTRON LTD0 citations41
US10297443B2May 21, 2019
Semiconductor device manufacturing method and semiconductor device manufacturing system
TOKYO ELECTRON LTD0 citations41
US8980371B2Mar 17, 2015
Film deposition method
TOKYO ELECTRON LTD0 citations41
US10550470B2Feb 4, 2020
Film forming apparatus and operation method of film forming apparatus
TOKYO ELECTRON LTD0 citations40