Inventor
MAKINOSHIMA TAKASHI
JP19 patents
Patents
19 patentsUS7871554B2Jan 18, 2011
Process for producing polyimide film
MITSUBISHI GAS CHEMICAL CO44 citations93
US11137686B2Oct 5, 2021
Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method
MITSUBISHI GAS CHEMICAL CO2 citations72
US10747112B2Aug 18, 2020
Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method
MITSUBISHI GAS CHEMICAL CO2 citations72
US11243467B2Feb 8, 2022
Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method
MITSUBISHI GAS CHEMICAL CO2 citations71
US10364314B2Jul 30, 2019
Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method
MITSUBISHI GAS CHEMICAL CO2 citations70
US11143962B2Oct 12, 2021
Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method
MITSUBISHI GAS CHEMICAL CO1 citations62
US10294183B2May 21, 2019
Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resin
MITSUBISHI GAS CHEMICAL CO1 citations62
US7659360B2Feb 9, 2010
Low water-absorptive polyimide resin and method for producing same
MITSUBISHI GAS CHEMICAL CO6 citations62
US11572430B2Feb 7, 2023
Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method
MITSUBISHI GAS CHEMICAL CO1 citations61
US11747728B2Sep 5, 2023
Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin
MITSUBISHI GAS CHEMICAL CO0 citations60
US10577323B2Mar 3, 2020
Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying compound or resin
MITSUBISHI GAS CHEMICAL CO1 citations59
US10310377B2Jun 4, 2019
Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method
MITSUBISHI GAS CHEMICAL CO0 citations51
US9920024B2Mar 20, 2018
Method for purifying compound or resin
MITSUBISHI GAS CHEMICAL CO1 citations51
US9809601B2Nov 7, 2017
Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method
MITSUBISHI GAS CHEMICAL CO1 citations51
US12134596B2Nov 5, 2024
Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin
MITSUBISHI GAS CHEMICAL CO0 citations50
US10745372B2Aug 18, 2020
Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method
MITSUBISHI GAS CHEMICAL CO0 citations41
US9828355B2Nov 28, 2017
Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming method
MITSUBISHI GAS CHEMICAL CO0 citations40
US10359701B2Jul 23, 2019
Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method
MITSUBISHI GAS CHEMICAL CO0 citations39
US10338471B2Jul 2, 2019
Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method
MITSUBISHI GAS CHEMICAL CO0 citations39