Inventor
DUAN REN-GUAN
US47 patents
⚠️ This page may combine multiple inventors who share the name “DUAN REN-GUAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
36 patentsUS9212099B2Dec 15, 2015
Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics
APPLIED MATERIALS INC56 citations98
US9090046B2Jul 28, 2015
Ceramic coated article and process for applying ceramic coating
APPLIED MATERIALS INC68 citations98
US9034199B2May 19, 2015
Ceramic article with reduced surface defect density and process for producing a ceramic article
APPLIED MATERIALS INC47 citations98
US8034734B2Oct 11, 2011
Semiconductor processing apparatus which is formed from yttrium oxide and zirconium oxide to produce a solid solution ceramic apparatus
APPLIED MATERIALS INC90 citations98
US7696117B2Apr 13, 2010
Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas
APPLIED MATERIALS INC132 citations98
US8367227B2Feb 5, 2013
Plasma-resistant ceramics with controlled electrical resistivity
APPLIED MATERIALS INC71 citations97
US9051219B2Jun 9, 2015
Semiconductor processing apparatus comprising a solid solution ceramic formed from yttrium oxide, zirconium oxide, and aluminum oxide
APPLIED MATERIALS INC16 citations93
US9394615B2Jul 19, 2016
Plasma resistant ceramic coated conductive article
APPLIED MATERIALS INC43 citations92
US10403535B2Sep 3, 2019
Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system
APPLIED MATERIALS INC11 citations83
US11299805B2Apr 12, 2022
Plasma corrision resistive heater for high temperature processing
APPLIED MATERIALS INC3 citations73
US11264261B2Mar 1, 2022
High temperature electrostatic chuck bonding adhesive
APPLIED MATERIALS INC2 citations73
US10847386B2Nov 24, 2020
Method of forming a bulk article and semiconductor chamber apparatus from yttrium oxide and zirconium oxide
APPLIED MATERIALS INC1 citations73
US10840112B2Nov 17, 2020
Coated article and semiconductor chamber apparatus formed from yttrium oxide and zirconium oxide
APPLIED MATERIALS INC2 citations73
US10364197B2Jul 30, 2019
Heat treated ceramic substrate having ceramic coating
APPLIED MATERIALS INC1 citations73
US10266943B2Apr 23, 2019
Plasma corrosion resistive heater for high temperature processing
APPLIED MATERIALS INC4 citations73
US9975320B2May 22, 2018
Diffusion bonded plasma resisted chemical vapor deposition (CVD) chamber heater
APPLIED MATERIALS INC2 citations73
US9556507B2Jan 31, 2017
Yttria-based material coated chemical vapor deposition chamber heater
APPLIED MATERIALS INC4 citations73
US9384950B2Jul 5, 2016
Chamber coatings
APPLIED MATERIALS INC4 citations72
US10612135B2Apr 7, 2020
Method and system for high temperature clean
APPLIED MATERIALS INC2 citations71
US11731907B2Aug 22, 2023
Ceramic material with high thermal shock resistance and high erosion resistance
APPLIED MATERIALS INC0 citations63
US11373882B2Jun 28, 2022
Coated article and semiconductor chamber apparatus formed from yttrium oxide and zirconium oxide
APPLIED MATERIALS INC0 citations63
US11279661B2Mar 22, 2022
Heat treated ceramic substrate having ceramic coating
APPLIED MATERIALS INC1 citations63
US11047043B2Jun 29, 2021
Chamber liner for high temperature processing
APPLIED MATERIALS INC0 citations62
US10840113B2Nov 17, 2020
Method of forming a coated article and semiconductor chamber apparatus from yttrium oxide and zirconium oxide
APPLIED MATERIALS INC0 citations52
US10711350B2Jul 14, 2020
Alumina layer formation on aluminum surface to protect aluminum parts
APPLIED MATERIALS INC0 citations52
US10622194B2Apr 14, 2020
Bulk sintered solid solution ceramic which exhibits fracture toughness and halogen plasma resistance
APPLIED MATERIALS INC0 citations52
US10480068B2Nov 19, 2019
Chamber liner for high temperature processing
APPLIED MATERIALS INC0 citations52
US10336656B2Jul 2, 2019
Ceramic article with reduced surface defect density
APPLIED MATERIALS INC0 citations52
US10242888B2Mar 26, 2019
Semiconductor processing apparatus with a ceramic-comprising surface which exhibits fracture toughness and halogen plasma resistance
APPLIED MATERIALS INC0 citations52
US10157731B2Dec 18, 2018
Semiconductor processing apparatus with protective coating including amorphous phase
APPLIED MATERIALS INC0 citations52
US9896376B2Feb 20, 2018
Ceramic component formed ceramic portions bonded together with a halogen plasma resistant bonding agent
APPLIED MATERIALS INC0 citations52
US9428424B2Aug 30, 2016
Critical chamber component surface improvement to reduce chamber particles
APPLIED MATERIALS INC1 citations52
US9597734B2Mar 21, 2017
Electrostatic chuck and showerhead with enhanced thermal properties and methods of making thereof
APPLIED MATERIALS INC0 citations51
US11270870B2Mar 8, 2022
Processing equipment component plating
APPLIED MATERIALS INC0 citations50
US11984302B2May 14, 2024
Magnetic-material shield around plasma chambers near pedestal
APPLIED MATERIALS INC0 citations47
US12592364B2Mar 31, 2026
Fluoride coating to improve chamber performance
APPLIED MATERIALS INC0 citations46
SUN JENNIFER Y
7 patentsUS8858745B2Oct 14, 2014
Corrosion-resistant bonding agents for bonding ceramic components which are exposed to plasmas
SUN JENNIFER Y50 citations98
US9017765B2Apr 28, 2015
Protective coatings resistant to reactive plasma processing
SUN JENNIFER Y33 citations94
US8758858B2Jun 24, 2014
Method of producing a plasma-resistant thermal oxide coating
SUN JENNIFER Y38 citations93
US8129029B2Mar 6, 2012
Erosion-resistant plasma chamber components comprising a metal base structure with an overlying thermal oxidation coating
SUN JENNIFER Y39 citations93
US8871312B2Oct 28, 2014
Method of reducing plasma arcing on surfaces of semiconductor processing apparatus components in a plasma processing chamber
SUN JENNIFER Y21 citations92
US8623527B2Jan 7, 2014
Semiconductor processing apparatus comprising a coating formed from a solid solution of yttrium oxide and zirconium oxide
SUN JENNIFER Y27 citations92
US9520314B2Dec 13, 2016
High temperature electrostatic chuck bonding adhesive
SUN JENNIFER Y4 citations73
TAIWAN SEMICONDUCTOR MFG CO LTD
2 patentsUS12275832B2Apr 15, 2025
Fluorine-containing elastomer composition and method for making cured fluorine-containing elastomer composition
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12049697B2Jul 30, 2024
Multilayer ALD coating for critical components in process chamber
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations47