P

Inventor

DUAN REN-GUAN

US47 patents
⚠️ This page may combine multiple inventors who share the name “DUAN REN-GUAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

36 patents
US9212099B2Dec 15, 2015

Heat treated ceramic substrate having ceramic coating and heat treatment for coated ceramics

APPLIED MATERIALS INC56 citations98
US9090046B2Jul 28, 2015

Ceramic coated article and process for applying ceramic coating

APPLIED MATERIALS INC68 citations98
US9034199B2May 19, 2015

Ceramic article with reduced surface defect density and process for producing a ceramic article

APPLIED MATERIALS INC47 citations98
US8034734B2Oct 11, 2011

Semiconductor processing apparatus which is formed from yttrium oxide and zirconium oxide to produce a solid solution ceramic apparatus

APPLIED MATERIALS INC90 citations98
US7696117B2Apr 13, 2010

Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas

APPLIED MATERIALS INC132 citations98
US8367227B2Feb 5, 2013

Plasma-resistant ceramics with controlled electrical resistivity

APPLIED MATERIALS INC71 citations97
US9051219B2Jun 9, 2015

Semiconductor processing apparatus comprising a solid solution ceramic formed from yttrium oxide, zirconium oxide, and aluminum oxide

APPLIED MATERIALS INC16 citations93
US9394615B2Jul 19, 2016

Plasma resistant ceramic coated conductive article

APPLIED MATERIALS INC43 citations92
US10403535B2Sep 3, 2019

Method and apparatus of processing wafers with compressive or tensile stress at elevated temperatures in a plasma enhanced chemical vapor deposition system

APPLIED MATERIALS INC11 citations83
US11299805B2Apr 12, 2022

Plasma corrision resistive heater for high temperature processing

APPLIED MATERIALS INC3 citations73
US11264261B2Mar 1, 2022

High temperature electrostatic chuck bonding adhesive

APPLIED MATERIALS INC2 citations73
US10847386B2Nov 24, 2020

Method of forming a bulk article and semiconductor chamber apparatus from yttrium oxide and zirconium oxide

APPLIED MATERIALS INC1 citations73
US10840112B2Nov 17, 2020

Coated article and semiconductor chamber apparatus formed from yttrium oxide and zirconium oxide

APPLIED MATERIALS INC2 citations73
US10364197B2Jul 30, 2019

Heat treated ceramic substrate having ceramic coating

APPLIED MATERIALS INC1 citations73
US10266943B2Apr 23, 2019

Plasma corrosion resistive heater for high temperature processing

APPLIED MATERIALS INC4 citations73
US9975320B2May 22, 2018

Diffusion bonded plasma resisted chemical vapor deposition (CVD) chamber heater

APPLIED MATERIALS INC2 citations73
US9556507B2Jan 31, 2017

Yttria-based material coated chemical vapor deposition chamber heater

APPLIED MATERIALS INC4 citations73
US9384950B2Jul 5, 2016

Chamber coatings

APPLIED MATERIALS INC4 citations72
US10612135B2Apr 7, 2020

Method and system for high temperature clean

APPLIED MATERIALS INC2 citations71
US11731907B2Aug 22, 2023

Ceramic material with high thermal shock resistance and high erosion resistance

APPLIED MATERIALS INC0 citations63
US11373882B2Jun 28, 2022

Coated article and semiconductor chamber apparatus formed from yttrium oxide and zirconium oxide

APPLIED MATERIALS INC0 citations63
US11279661B2Mar 22, 2022

Heat treated ceramic substrate having ceramic coating

APPLIED MATERIALS INC1 citations63
US11047043B2Jun 29, 2021

Chamber liner for high temperature processing

APPLIED MATERIALS INC0 citations62
US10840113B2Nov 17, 2020

Method of forming a coated article and semiconductor chamber apparatus from yttrium oxide and zirconium oxide

APPLIED MATERIALS INC0 citations52
US10711350B2Jul 14, 2020

Alumina layer formation on aluminum surface to protect aluminum parts

APPLIED MATERIALS INC0 citations52
US10622194B2Apr 14, 2020

Bulk sintered solid solution ceramic which exhibits fracture toughness and halogen plasma resistance

APPLIED MATERIALS INC0 citations52
US10480068B2Nov 19, 2019

Chamber liner for high temperature processing

APPLIED MATERIALS INC0 citations52
US10336656B2Jul 2, 2019

Ceramic article with reduced surface defect density

APPLIED MATERIALS INC0 citations52
US10242888B2Mar 26, 2019

Semiconductor processing apparatus with a ceramic-comprising surface which exhibits fracture toughness and halogen plasma resistance

APPLIED MATERIALS INC0 citations52
US10157731B2Dec 18, 2018

Semiconductor processing apparatus with protective coating including amorphous phase

APPLIED MATERIALS INC0 citations52
US9896376B2Feb 20, 2018

Ceramic component formed ceramic portions bonded together with a halogen plasma resistant bonding agent

APPLIED MATERIALS INC0 citations52
US9428424B2Aug 30, 2016

Critical chamber component surface improvement to reduce chamber particles

APPLIED MATERIALS INC1 citations52
US9597734B2Mar 21, 2017

Electrostatic chuck and showerhead with enhanced thermal properties and methods of making thereof

APPLIED MATERIALS INC0 citations51
US11270870B2Mar 8, 2022

Processing equipment component plating

APPLIED MATERIALS INC0 citations50
US11984302B2May 14, 2024

Magnetic-material shield around plasma chambers near pedestal

APPLIED MATERIALS INC0 citations47
US12592364B2Mar 31, 2026

Fluoride coating to improve chamber performance

APPLIED MATERIALS INC0 citations46

SUN JENNIFER Y

7 patents

TAIWAN SEMICONDUCTOR MFG CO LTD

2 patents

SUN JENNIFER

1 patent

UNIV CALIFORNIA

1 patent