P

Inventor

LEE JIN IL

KR32 patents
⚠️ This page may combine multiple inventors who share the name “LEE JIN IL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

20 patents
US7943502B2May 17, 2011

Method of forming a phase change memory device

SAMSUNG ELECTRONICS CO LTD26 citations92
US7727884B2Jun 1, 2010

Methods of forming a semiconductor device including a phase change material layer

SAMSUNG ELECTRONICS CO LTD19 citations92
US7569417B2Aug 4, 2009

Method of forming a phase changeable material layer, a method of manufacturing a phase changeable memory unit, and a method of manufacturing a phase changeable semiconductor memory device

SAMSUNG ELECTRONICS CO LTD38 citations92
US7271055B2Sep 18, 2007

Methods of forming low leakage currents metal-insulator-metal (MIM) capacitors and related MIM capacitors

SAMSUNG ELECTRONICS CO LTD26 citations92
US7514315B2Apr 7, 2009

Methods of forming capacitor structures having aluminum oxide diffusion barriers

SAMSUNG ELECTRONICS CO LTD8 citations84
US8034683B2Oct 11, 2011

Method of forming a phase change material layer, method of forming a phase change memory device using the same, and a phase change memory device so formed

SAMSUNG ELECTRONICS CO LTD8 citations83
US7759667B2Jul 20, 2010

Phase change memory device including resistant material

SAMSUNG ELECTRONICS CO LTD17 citations83
US7049232B2May 23, 2006

Methods for forming ruthenium films with β-diketone containing ruthenium complexes and method for manufacturing metal-insulator-metal capacitor using the same

SAMSUNG ELECTRONICS CO LTD8 citations74
US10366955B2Jul 30, 2019

Semiconductor device including conductive structure having nucleation structure and method of forming the same

SAMSUNG ELECTRONICS CO LTD1 citations72
US7838326B2Nov 23, 2010

Methods of fabricating semiconductor device including phase change layer

SAMSUNG ELECTRONICS CO LTD5 citations63
US7803654B2Sep 28, 2010

Variable resistance non-volatile memory cells and methods of fabricating same

SAMSUNG ELECTRONICS CO LTD6 citations63
US7432183B2Oct 7, 2008

Methods of manufacturing a thin film including zirconium titanium oxide and methods of manufacturing a gate structure, a capacitor and a flash memory device including the same

SAMSUNG ELECTRONICS CO LTD3 citations63
US7091102B2Aug 15, 2006

Methods of forming integrated circuit devices having a capacitor with a hydrogen barrier spacer on a sidewall thereof and integrated circuit devices formed thereby

SAMSUNG ELECTRONICS CO LTD4 citations63
US7034350B2Apr 25, 2006

Capacitors including a cavity containing a buried layer

SAMSUNG ELECTRONICS CO LTD3 citations63
US7867880B2Jan 11, 2011

Metal precursors for low temperature deposition and methods of forming a metal thin layer and manufacturing a phase-change memory device using the metal precursors

SAMSUNG ELECTRONICS CO LTD6 citations62
US8834968B2Sep 16, 2014

Method of forming phase change material layer using Ge(II) source, and method of fabricating phase change memory device

SAMSUNG ELECTRONICS CO LTD0 citations52
US8021977B2Sep 20, 2011

Methods of forming contact structures and semiconductor devices fabricated using contact structures

SAMSUNG ELECTRONICS CO LTD0 citations52
US10847464B2Nov 24, 2020

Semiconductor device including conductive structure having nucleation structure and method of forming the same

SAMSUNG ELECTRONICS CO LTD0 citations51
US10580736B2Mar 3, 2020

Semiconductor device including conductive structure having nucleation structure and method of forming the same

SAMSUNG ELECTRONICS CO LTD0 citations51
US7855145B2Dec 21, 2010

Gap filling method and method for forming semiconductor memory device using the same

SAMSUNG ELECTRONICS CO LTD0 citations41

PARK HYE-YOUNG

2 patents

BAE BYOUNG-JAE

2 patents

LEE JIN-IL

2 patents

KIM SI-HONG

1 patent

SEOL HO-SEOK

1 patent

PARK HAN OH

1 patent

PARK YOUNG-LIM

1 patent

BIONEER CORP

1 patent

OH GYU-HWAN

1 patent