Inventor
JANAKIRAMAN KARTHIK
US75 patents
⚠️ This page may combine multiple inventors who share the name “JANAKIRAMAN KARTHIK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
46 patentsUS6830624B2Dec 14, 2004
Blocker plate by-pass for remote plasma clean
APPLIED MATERIALS INC328 citations98
US6793733B2Sep 21, 2004
Gas distribution showerhead
APPLIED MATERIALS INC145 citations97
US6387207B1May 14, 2002
Integration of remote plasma generator with semiconductor processing chamber
APPLIED MATERIALS INC944 citations97
US10774423B2Sep 15, 2020
Tunable ground planes in plasma chambers
APPLIED MATERIALS INC41 citations94
US10056279B2Aug 21, 2018
Semiconductor process equipment
APPLIED MATERIALS INC22 citations94
US7452827B2Nov 18, 2008
Gas distribution showerhead featuring exhaust apertures
APPLIED MATERIALS INC41 citations90
US6843882B2Jan 18, 2005
Gas flow control in a wafer processing system having multiple chambers for performing same process
APPLIED MATERIALS INC47 citations90
US7037376B2May 2, 2006
Backflush chamber clean
APPLIED MATERIALS INC23 citations89
US10734265B2Aug 4, 2020
Semiconductor process equipment
APPLIED MATERIALS INC13 citations85
US10483141B2Nov 19, 2019
Semiconductor process equipment
APPLIED MATERIALS INC13 citations84
US10410869B2Sep 10, 2019
CVD based oxide-metal multi structure for 3D NAND memory devices
APPLIED MATERIALS INC8 citations84
US10236197B2Mar 19, 2019
Processing system containing an isolation region separating a deposition chamber from a treatment chamber
APPLIED MATERIALS INC11 citations84
US7867578B2Jan 11, 2011
Method for depositing an amorphous carbon film with improved density and step coverage
APPLIED MATERIALS INC12 citations84
US10711347B2Jul 14, 2020
Micro-volume deposition chamber
APPLIED MATERIALS INC2 citations73
US10559465B2Feb 11, 2020
Pre-treatment approach to improve continuity of ultra-thin amorphous silicon film on silicon oxide
APPLIED MATERIALS INC5 citations73
US11694902B2Jul 4, 2023
Methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layers
APPLIED MATERIALS INC2 citations72
US11640905B2May 2, 2023
Plasma enhanced deposition of silicon-containing films at low temperature
APPLIED MATERIALS INC2 citations72
US11618949B2Apr 4, 2023
Methods to reduce material surface roughness
APPLIED MATERIALS INC2 citations72
US11527408B2Dec 13, 2022
Multiple spacer patterning schemes
APPLIED MATERIALS INC4 citations71
US11335555B2May 17, 2022
Methods for conformal doping of three dimensional structures
APPLIED MATERIALS INC0 citations63
US10094486B2Oct 9, 2018
Method and system for supplying a cleaning gas into a process chamber
APPLIED MATERIALS INC1 citations63
US7922440B2Apr 12, 2011
Apparatus and method for centering a substrate in a process chamber
APPLIED MATERIALS INC6 citations63
US7514125B2Apr 7, 2009
Methods to improve the in-film defectivity of PECVD amorphous carbon films
APPLIED MATERIALS INC2 citations63
US12482646B2Nov 25, 2025
Processes for depositing SiB films
APPLIED MATERIALS INC0 citations62
US12365986B2Jul 22, 2025
Remote capacitively coupled plasma deposition of amorphous silicon
APPLIED MATERIALS INC0 citations62
US12205818B2Jan 21, 2025
Boron concentration tunability in boron-silicon films
APPLIED MATERIALS INC0 citations62
US12077852B2Sep 3, 2024
Metal-doped boron films
APPLIED MATERIALS INC0 citations62
US11961739B2Apr 16, 2024
Boron concentration tunability in boron-silicon films
APPLIED MATERIALS INC0 citations62
US11939674B2Mar 26, 2024
Methods to reduce material surface roughness
APPLIED MATERIALS INC0 citations62
US11939675B2Mar 26, 2024
Apparatus and methods for improving thermal chemical vapor deposition (CVD) uniformity
APPLIED MATERIALS INC1 citations62
US11817320B2Nov 14, 2023
CVD based oxide-metal multi structure for 3D NAND memory devices
APPLIED MATERIALS INC0 citations62
US11699585B2Jul 11, 2023
Methods of forming hardmasks
APPLIED MATERIALS INC0 citations62
US11664214B2May 30, 2023
Methods for producing high-density, nitrogen-doped carbon films for hardmasks and other patterning applications
APPLIED MATERIALS INC0 citations62
US11664226B2May 30, 2023
Methods for producing high-density carbon films for hardmasks and other patterning applications
APPLIED MATERIALS INC1 citations62
US11443919B2Sep 13, 2022
Film formation via pulsed RF plasma
APPLIED MATERIALS INC0 citations62
US10438860B2Oct 8, 2019
Dynamic wafer leveling/tilting/swiveling steps for use during a chemical vapor deposition process
APPLIED MATERIALS INC1 citations62
US7699935B2Apr 20, 2010
Method and system for supplying a cleaning gas into a process chamber
APPLIED MATERIALS INC3 citations62
US12362181B2Jul 15, 2025
Methods of forming thermally stable carbon film
APPLIED MATERIALS INC0 citations61
US12131913B2Oct 29, 2024
Methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layers
APPLIED MATERIALS INC0 citations61
US12033848B2Jul 9, 2024
Processes for depositing sib films
APPLIED MATERIALS INC0 citations61
US11791136B2Oct 17, 2023
Deposition radial and edge profile tunability through independent control of TEOS flow
APPLIED MATERIALS INC0 citations61
US11170990B2Nov 9, 2021
Polysilicon liners
APPLIED MATERIALS INC0 citations61
US11017986B2May 25, 2021
Deposition radial and edge profile tunability through independent control of TEOS flow
APPLIED MATERIALS INC0 citations61
US12568791B2Mar 3, 2026
Controlling concentration profiles for deposited films using machine learning
APPLIED MATERIALS INC0 citations60
US12469700B2Nov 11, 2025
Ion implantation for reduced hydrogen incorporation in amorphous silicon
APPLIED MATERIALS INC0 citations60
US11699577B2Jul 11, 2023
Treatment for high-temperature cleans
APPLIED MATERIALS INC0 citations60
SHAH ASHISH
1 patentPADHI DEENESH
1 patentBERGER ALEXANDER J
1 patentINTEVAC INC
1 patentShowing the top 50 of 75 patents by PatentIndex Score.