Inventor
YANAI HIDEHIRO
JP19 patents
⚠️ This page may combine multiple inventors who share the name “YANAI HIDEHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI INT ELECTRIC INC
10 patentsUS10287684B2May 14, 2019
Substrate processing apparatus
HITACHI INT ELECTRIC INC338 citations98
US7648578B1Jan 19, 2010
Substrate processing apparatus, and method for manufacturing semiconductor device
HITACHI INT ELECTRIC INC30 citations92
US8986450B1Mar 24, 2015
Substrate processing apparatus and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC8 citations84
US8925562B1Jan 6, 2015
Substrate processing apparatus and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC6 citations84
US10763084B2Sep 1, 2020
Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus
HITACHI INT ELECTRIC INC4 citations82
US9508546B2Nov 29, 2016
Method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC3 citations73
US7579276B2Aug 25, 2009
Substrate processing apparatus and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC3 citations62
US9659767B2May 23, 2017
Substrate processing apparatus and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC1 citations52
US7923380B2Apr 12, 2011
Substrate processing apparatus and substrate processing method
HITACHI INT ELECTRIC INC0 citations52
US10403478B2Sep 3, 2019
Plasma processing apparatus and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC0 citations40
KOKUSAI ELECTRIC CORP
4 patentsUS11101111B2Aug 24, 2021
Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus
KOKUSAI ELECTRIC CORP3 citations71
US12505989B2Dec 23, 2025
Substrate processing apparatus, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations60
US11948778B2Apr 2, 2024
Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations60
US11530481B2Dec 20, 2022
Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
KOKUSAI ELECTRIC CORP0 citations52