Inventor
SHAW DENIS
US21 patents
⚠️ This page may combine multiple inventors who share the name “SHAW DENIS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED ENERGY IND INC
20 patentsUS10607813B2Mar 31, 2020
Synchronized pulsing of plasma processing source and substrate bias
ADVANCED ENERGY IND INC104 citations99
US10896807B2Jan 19, 2021
Synchronization between an excitation source and a substrate bias supply
ADVANCED ENERGY IND INC58 citations98
US10811228B2Oct 20, 2020
Control of plasma processing systems that include plasma modulating supplies
ADVANCED ENERGY IND INC57 citations98
US10811227B2Oct 20, 2020
Application of modulating supplies in a plasma processing system
ADVANCED ENERGY IND INC51 citations98
US10811229B2Oct 20, 2020
Synchronization with a bias supply in a plasma processing system
ADVANCED ENERGY IND INC51 citations98
US10707055B2Jul 7, 2020
Spatial and temporal control of ion bias voltage for plasma processing
ADVANCED ENERGY IND INC55 citations98
US11437221B2Sep 6, 2022
Spatial monitoring and control of plasma processing environments
ADVANCED ENERGY IND INC16 citations94
US11282677B2Mar 22, 2022
Spatial monitoring and control of plasma processing environments
ADVANCED ENERGY IND INC15 citations94
US11264209B2Mar 1, 2022
Application of modulating supplies in a plasma processing system
ADVANCED ENERGY IND INC13 citations94
US10026595B2Jul 17, 2018
Apparatus for frequency tuning in a RF generator
ADVANCED ENERGY IND INC26 citations93
US9748076B1Aug 29, 2017
Apparatus for frequency tuning in a RF generator
ADVANCED ENERGY IND INC37 citations93
US12142460B2Nov 12, 2024
Control of plasma sheath with bias supplies
ADVANCED ENERGY IND INC3 citations75
US12159767B2Dec 3, 2024
Spatial control of plasma processing environments
ADVANCED ENERGY IND INC2 citations73
US11842884B2Dec 12, 2023
Spatial monitoring and control of plasma processing environments
ADVANCED ENERGY IND INC1 citations73
US11610761B2Mar 21, 2023
Synchronization between an excitation source and a substrate bias supply
ADVANCED ENERGY IND INC3 citations73
US12567572B2Mar 3, 2026
Plasma behaviors predicted by current measurements during asymmetric bias waveform application
ADVANCED ENERGY IND INC0 citations62
US12505986B2Dec 23, 2025
Synchronization of plasma processing components
ADVANCED ENERGY IND INC0 citations62
US12176184B2Dec 24, 2024
Synchronization of bias supplies
ADVANCED ENERGY IND INC0 citations62
US12009181B2Jun 11, 2024
Match efficiency-variation compensation
ADVANCED ENERGY IND INC0 citations41
US7942112B2May 17, 2011
Method and apparatus for preventing the formation of a plasma-inhibiting substance
ADVANCED ENERGY IND INC0 citations41