Inventor
MASUYAMA TATSURO
JP65 patents
⚠️ This page may combine multiple inventors who share the name “MASUYAMA TATSURO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SUMITOMO CHEMICAL CO
36 patentsUS9563123B2Feb 7, 2017
Photoresist composition, compound and process of producing photoresist pattern
SUMITOMO CHEMICAL CO15 citations84
US9448475B2Sep 20, 2016
Photoresist composition, compound and process of producing photoresist pattern
SUMITOMO CHEMICAL CO14 citations84
US8354217B2Jan 15, 2013
Salt and photoresist composition containing the same
SUMITOMO CHEMICAL CO10 citations84
US11467490B2Oct 11, 2022
Salt, acid generator, resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO2 citations73
US11198748B2Dec 14, 2021
Resin, resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO2 citations73
US9644056B2May 9, 2017
Compound, resin and photoresist composition
SUMITOMO CHEMICAL CO2 citations73
US9563125B2Feb 7, 2017
Resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO4 citations73
US9562032B2Feb 7, 2017
Salt and photoresist composition comprising the same
SUMITOMO CHEMICAL CO2 citations73
US10168616B2Jan 1, 2019
Photoresist composition and process of producing photoresist pattern
SUMITOMO CHEMICAL CO1 citations63
US10882839B2Jan 5, 2021
Salt and photoresist composition containing the same
SUMITOMO CHEMICAL CO0 citations57
US12174537B2Dec 24, 2024
Salt, acid generator, resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO0 citations52
US11947257B2Apr 2, 2024
Salt, acid generator, resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO0 citations52
US11822244B2Nov 21, 2023
Compound, resin, resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO0 citations52
US11815813B2Nov 14, 2023
Compound, resin, resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO0 citations52
US11739056B2Aug 29, 2023
Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO0 citations52
US11681218B2Jun 20, 2023
Compound, resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO0 citations52
US11474431B2Oct 18, 2022
Compound, resin, photoresist composition and process for producing photoresist pattern
SUMITOMO CHEMICAL CO0 citations52
US11366387B2Jun 21, 2022
Salt, acid generator, resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO0 citations52
US11327399B2May 10, 2022
Photoresist composition and process for producing photoresist pattern
SUMITOMO CHEMICAL CO0 citations52
US11261273B2Mar 1, 2022
Resin, resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO0 citations52
US11214635B2Jan 4, 2022
Compound, resin, resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO0 citations52
US10975028B2Apr 13, 2021
Salt and photoresist composition containing the same
SUMITOMO CHEMICAL CO0 citations52
US10781198B2Sep 22, 2020
Compound, resin, photoresist composition and process for producing photoresist pattern
SUMITOMO CHEMICAL CO0 citations52
US10774029B2Sep 15, 2020
Compound, resin, resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO0 citations52
US10725380B2Jul 28, 2020
Compound, resin, resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO0 citations52
US9971241B2May 15, 2018
Compound, resin, resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO1 citations52
US9822060B2Nov 21, 2017
Compound, resin, resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO0 citations52
US9740102B2Aug 22, 2017
Photoresist composition and method for producing photoresist pattern
SUMITOMO CHEMICAL CO0 citations52
US9638997B2May 2, 2017
Resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO0 citations52
US9638996B2May 2, 2017
Resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO0 citations52
US9612533B2Apr 4, 2017
Salt and photoresist composition comprising the same
SUMITOMO CHEMICAL CO0 citations52
US9562122B2Feb 7, 2017
Compound, resin, resist composition and method for producing resist pattern
SUMITOMO CHEMICAL CO0 citations52
US9229321B2Jan 5, 2016
Salt and photoresist composition comprising the same
SUMITOMO CHEMICAL CO1 citations51
US10816902B2Oct 27, 2020
Salt and photoresist composition containing the same
SUMITOMO CHEMICAL CO0 citations42
US10670963B2Jun 2, 2020
Salt and photoresist composition containing the same
SUMITOMO CHEMICAL CO0 citations42
US10564544B2Feb 18, 2020
Photoresist composition
SUMITOMO CHEMICAL CO0 citations42
MASUYAMA TATSURO
8 patentsUS8574811B2Nov 5, 2013
Resist composition and method for producing resist pattern
MASUYAMA TATSURO5 citations73
US8951709B2Feb 10, 2015
Resist composition and method for producing resist pattern
MASUYAMA TATSURO2 citations62
US8426106B2Apr 23, 2013
Photoresist composition
MASUYAMA TATSURO2 citations61
US8173353B2May 8, 2012
Sulfonium compound
MASUYAMA TATSURO4 citations55
US8765357B2Jul 1, 2014
Resin and photoresist composition comprising same
MASUYAMA TATSURO0 citations52
US9428485B2Aug 30, 2016
Salt, photoresist composition and method for producing photoresist pattern
MASUYAMA TATSURO1 citations51
US9051251B2Jun 9, 2015
Salt, photoresist composition and method for producing photoresist pattern
MASUYAMA TATSURO1 citations51
US8475999B2Jul 2, 2013
Compound and photoresist composition containing the same
MASUYAMA TATSURO1 citations51
ICHIKAWA KOJI
5 patentsUS9176379B2Nov 3, 2015
Resist composition and method for producing resist pattern
ICHIKAWA KOJI13 citations84
US8318403B2Nov 27, 2012
Salt and photoresist composition containing the same
ICHIKAWA KOJI17 citations84
US8652753B2Feb 18, 2014
Resist composition and method for producing resist pattern
ICHIKAWA KOJI2 citations63
US8563219B2Oct 22, 2013
Resist composition and method for producing resist pattern
ICHIKAWA KOJI2 citations63
US8278023B2Oct 2, 2012
Salt and photoresist composition containing the same
ICHIKAWA KOJI3 citations62
TAKEMOTO ICHIKI
1 patentShowing the top 50 of 65 patents by PatentIndex Score.