Inventor
TAGAWA SEIICHI
JP14 patents
⚠️ This page may combine multiple inventors who share the name “TAGAWA SEIICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
UNIV OSAKA
7 patentsUS10073349B2Sep 11, 2018
Chemically amplified resist material, pattern-forming method, compound, and production method of compound
UNIV OSAKA2 citations62
US10670967B2Jun 2, 2020
Resist patterning method, latent resist image forming device, resist patterning device, and resist material
UNIV OSAKA1 citations61
US9977332B2May 22, 2018
Resist patterning method, latent resist image forming device, resist patterning device, and resist material
UNIV OSAKA1 citations51
US11796919B2Oct 24, 2023
Resist pattern formation method
UNIV OSAKA0 citations50
US11187984B2Nov 30, 2021
Resist patterning method and resist material
UNIV OSAKA0 citations50
US10073348B2Sep 11, 2018
Resist-pattern-forming method and chemically amplified resist material
UNIV OSAKA0 citations41
US9971247B2May 15, 2018
Pattern-forming method
UNIV OSAKA0 citations41
TOKYO ELECTRON LTD
3 patentsUS10025187B2Jul 17, 2018
Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting
TOKYO ELECTRON LTD8 citations83
US10429745B2Oct 1, 2019
Photo-sensitized chemically amplified resist (PS-CAR) simulation
TOKYO ELECTRON LTD3 citations72
US10025190B2Jul 17, 2018
Substrate treatment system
TOKYO ELECTRON LTD2 citations71