P

Inventor

KAJI MAKOTO

JP39 patents
⚠️ This page may combine multiple inventors who share the name “KAJI MAKOTO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI CHEMICAL CO LTD

27 patents
US5889141AMar 30, 1999

Photoimageable compositions comprising polyquinoline polymer and diazo compound

HITACHI CHEMICAL CO LTD38 citations92
US5472823ADec 5, 1995

Photosensitive resin composition

HITACHI CHEMICAL CO LTD30 citations92
US6071667AJun 6, 2000

Photosensitive resin composition containing a photosensitive polyamide resin

HITACHI CHEMICAL CO LTD17 citations91
US7625642B2Dec 1, 2009

Borazine-based resin, and method for production thereof, borazine based resin composition, insulating coating and method for formation thereof, and electronic parts having the insulating coating

HITACHI CHEMICAL CO LTD12 citations83
US5811218ASep 22, 1998

Photoinitiator compositions including amino acids, coumarin and titanocene and photosensitive materials using the same

HITACHI CHEMICAL CO LTD17 citations83
US7935472B2May 3, 2011

Photo-curable resin composition and a method for forming a pattern using the same

HITACHI CHEMICAL CO LTD11 citations82
US5856059AJan 5, 1999

Photosensitive resin composition

HITACHI CHEMICAL CO LTD16 citations81
US5198402AMar 30, 1993

Aryl triflate compound, radiologically acid producing agent, radiologically acid producing agent system, and radiosensitive composition

HITACHI CHEMICAL CO LTD13 citations74
US4987057AJan 22, 1991

Photoinitiator and photopolymerizable composition using the same

HITACHI CHEMICAL CO LTD17 citations74
US6524770B1Feb 25, 2003

Hexaaryl biimidazole compounds as photoinitiators, photosensitive composition and method of manufacturing patterns using the compounds

HITACHI CHEMICAL CO LTD7 citations73
US5847071ADec 8, 1998

Photosensitive resin composition

HITACHI CHEMICAL CO LTD6 citations73
US5668248ASep 16, 1997

Photosensitive resin composition

HITACHI CHEMICAL CO LTD11 citations73
US6319656B1Nov 20, 2001

Photosensitive polyimide precursor and its use for pattern formation

HITACHI CHEMICAL CO LTD6 citations72
US6025113AFeb 15, 2000

Photosensitve polymide precursor and its use for pattern formation

HITACHI CHEMICAL CO LTD12 citations72
US5153236AOct 6, 1992

Photopolymerizable composition

HITACHI CHEMICAL CO LTD11 citations71
US5034429AJul 23, 1991

Photopolymerizable composition

HITACHI CHEMICAL CO LTD7 citations71
US5302725AApr 12, 1994

Aryl triflate compounds and radiologically acid producing agents thereof

HITACHI CHEMICAL CO LTD2 citations63
US5219496AJun 15, 1993

Non-linear optical material and non-linear optical devices

HITACHI CHEMICAL CO LTD2 citations63
US6197475B1Mar 6, 2001

Positive type photosensitive resin composition containing an alkali-soluble polymer and a compound which forms an amine compound with irradiation of light

HITACHI CHEMICAL CO LTD2 citations62
US6194126B1Feb 27, 2001

Pattern-forming process using photosensitive resin composition

HITACHI CHEMICAL CO LTD3 citations62
US6309791B1Oct 30, 2001

Polyimide precursor, polyimide and their use

HITACHI CHEMICAL CO LTD3 citations61
US6143475ANov 7, 2000

Polyimide precursor, polyimide and their use

HITACHI CHEMICAL CO LTD1 citations61
US5262090ANov 16, 1993

16-benzalandrosta-1,4-diene-3,17-dione compounds and non-linear optical material

HITACHI CHEMICAL CO LTD0 citations52
US8362199B2Jan 29, 2013

Borazine-based resin, process for its production, borazine-based resin composition, insulating film and method for its formation

HITACHI CHEMICAL CO LTD0 citations51
US7153631B2Dec 26, 2006

Pattern-forming process using photosensitive resin composition

HITACHI CHEMICAL CO LTD0 citations51
US5467421ANov 14, 1995

Nonlinear optical material and devices utilizing said material

HITACHI CHEMICAL CO LTD3 citations51
US7622243B2Nov 24, 2009

Photosensitive element, resist pattern formation method and printed wiring board production method

HITACHI CHEMICAL CO LTD1 citations48

HITACHI CHEM DUPONT MICROSYS

5 patents

MITSUBISHI HEAVY IND MACH SYSTEMS LTD

2 patents

OGINO MASAHIKO

1 patent

HATACHI CHEMICAL COMPANY LTD

1 patent

SAKURAI HIDEAKI

1 patent

MITSUBISHI HEAVY IND PRINTING

1 patent

TASAKA NORIFUMI

1 patent