Inventor
KAJI MAKOTO
JP39 patents
⚠️ This page may combine multiple inventors who share the name “KAJI MAKOTO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI CHEMICAL CO LTD
27 patentsUS5889141AMar 30, 1999
Photoimageable compositions comprising polyquinoline polymer and diazo compound
HITACHI CHEMICAL CO LTD38 citations92
US5472823ADec 5, 1995
Photosensitive resin composition
HITACHI CHEMICAL CO LTD30 citations92
US6071667AJun 6, 2000
Photosensitive resin composition containing a photosensitive polyamide resin
HITACHI CHEMICAL CO LTD17 citations91
US7625642B2Dec 1, 2009
Borazine-based resin, and method for production thereof, borazine based resin composition, insulating coating and method for formation thereof, and electronic parts having the insulating coating
HITACHI CHEMICAL CO LTD12 citations83
US5811218ASep 22, 1998
Photoinitiator compositions including amino acids, coumarin and titanocene and photosensitive materials using the same
HITACHI CHEMICAL CO LTD17 citations83
US7935472B2May 3, 2011
Photo-curable resin composition and a method for forming a pattern using the same
HITACHI CHEMICAL CO LTD11 citations82
US5856059AJan 5, 1999
Photosensitive resin composition
HITACHI CHEMICAL CO LTD16 citations81
US5198402AMar 30, 1993
Aryl triflate compound, radiologically acid producing agent, radiologically acid producing agent system, and radiosensitive composition
HITACHI CHEMICAL CO LTD13 citations74
US4987057AJan 22, 1991
Photoinitiator and photopolymerizable composition using the same
HITACHI CHEMICAL CO LTD17 citations74
US6524770B1Feb 25, 2003
Hexaaryl biimidazole compounds as photoinitiators, photosensitive composition and method of manufacturing patterns using the compounds
HITACHI CHEMICAL CO LTD7 citations73
US5847071ADec 8, 1998
Photosensitive resin composition
HITACHI CHEMICAL CO LTD6 citations73
US5668248ASep 16, 1997
Photosensitive resin composition
HITACHI CHEMICAL CO LTD11 citations73
US6319656B1Nov 20, 2001
Photosensitive polyimide precursor and its use for pattern formation
HITACHI CHEMICAL CO LTD6 citations72
US6025113AFeb 15, 2000
Photosensitve polymide precursor and its use for pattern formation
HITACHI CHEMICAL CO LTD12 citations72
US5153236AOct 6, 1992
Photopolymerizable composition
HITACHI CHEMICAL CO LTD11 citations71
US5034429AJul 23, 1991
Photopolymerizable composition
HITACHI CHEMICAL CO LTD7 citations71
US5302725AApr 12, 1994
Aryl triflate compounds and radiologically acid producing agents thereof
HITACHI CHEMICAL CO LTD2 citations63
US5219496AJun 15, 1993
Non-linear optical material and non-linear optical devices
HITACHI CHEMICAL CO LTD2 citations63
US6197475B1Mar 6, 2001
Positive type photosensitive resin composition containing an alkali-soluble polymer and a compound which forms an amine compound with irradiation of light
HITACHI CHEMICAL CO LTD2 citations62
US6194126B1Feb 27, 2001
Pattern-forming process using photosensitive resin composition
HITACHI CHEMICAL CO LTD3 citations62
US6309791B1Oct 30, 2001
Polyimide precursor, polyimide and their use
HITACHI CHEMICAL CO LTD3 citations61
US6143475ANov 7, 2000
Polyimide precursor, polyimide and their use
HITACHI CHEMICAL CO LTD1 citations61
US5262090ANov 16, 1993
16-benzalandrosta-1,4-diene-3,17-dione compounds and non-linear optical material
HITACHI CHEMICAL CO LTD0 citations52
US8362199B2Jan 29, 2013
Borazine-based resin, process for its production, borazine-based resin composition, insulating film and method for its formation
HITACHI CHEMICAL CO LTD0 citations51
US7153631B2Dec 26, 2006
Pattern-forming process using photosensitive resin composition
HITACHI CHEMICAL CO LTD0 citations51
US5467421ANov 14, 1995
Nonlinear optical material and devices utilizing said material
HITACHI CHEMICAL CO LTD3 citations51
US7622243B2Nov 24, 2009
Photosensitive element, resist pattern formation method and printed wiring board production method
HITACHI CHEMICAL CO LTD1 citations48
HITACHI CHEM DUPONT MICROSYS
5 patentsUS6436593B1Aug 20, 2002
Positive photosensitive resin composition, process for producing pattern and electronic parts
HITACHI CHEM DUPONT MICROSYS33 citations92
US6329494B1Dec 11, 2001
Photosensitive resin composition
HITACHI CHEM DUPONT MICROSYS15 citations91
US6600053B2Jul 29, 2003
Method of preparing photosensitive resin composition
HITACHI CHEM DUPONT MICROSYS6 citations72
US6342333B1Jan 29, 2002
Photosensitive resin composition, patterning method, and electronic components
HITACHI CHEM DUPONT MICROSYS9 citations72
US6773866B2Aug 10, 2004
Photosensitive resin composition, patterning method, and electronic components
HITACHI CHEM DUPONT MICROSYS2 citations61