Inventor
JAMES DAVID B
US70 patents
⚠️ This page may combine multiple inventors who share the name “JAMES DAVID B”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
RODEL INC
31 patentsUS6022268AFeb 8, 2000
Polishing pads and methods relating thereto
RODEL INC157 citations99
US6454634B1Sep 24, 2002
Polishing pads for chemical mechanical planarization
RODEL INC123 citations98
US6171181B1Jan 9, 2001
Molded polishing pad having integral window
RODEL INC165 citations98
US6022264AFeb 8, 2000
Polishing pad and methods relating thereto
RODEL INC99 citations98
US6017265AJan 25, 2000
Methods for using polishing pads
RODEL INC186 citations98
US6749485B1Jun 15, 2004
Hydrolytically stable grooved polishing pads for chemical mechanical planarization
RODEL INC98 citations97
US6736709B1May 18, 2004
Grooved polishing pads for chemical mechanical planarization
RODEL INC96 citations97
US6069080AMay 30, 2000
Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the like
RODEL INC126 citations97
US6582283B2Jun 24, 2003
Polishing pads for chemical mechanical planarization
RODEL INC71 citations96
US6488570B1Dec 3, 2002
Method relating to a polishing system having a multi-phase polishing layer
RODEL INC68 citations96
US6375559B1Apr 23, 2002
Polishing system having a multi-phase polishing substrate and methods relating thereto
RODEL INC61 citations96
US6210254B1Apr 3, 2001
Method of manufacturing a polymeric polishing pad having photolithographically induced surface pattern(s)
RODEL INC45 citations96
US6099394AAug 8, 2000
Polishing system having a multi-phase polishing substrate and methods relating thereto
RODEL INC82 citations96
US6036579AMar 14, 2000
Polymeric polishing pad having photolithographically induced surface patterns(s) and methods relating thereto
RODEL INC82 citations96
US6019666AFeb 1, 2000
Mosaic polishing pads and methods relating thereto
RODEL INC69 citations96
US5932486AAug 3, 1999
Apparatus and methods for recirculating chemical-mechanical polishing of semiconductor wafers
RODEL INC83 citations96
US6682402B1Jan 27, 2004
Polishing pads and methods relating thereto
RODEL INC47 citations95
US6387312B1May 14, 2002
Molding a polishing pad having integral window
RODEL INC56 citations95
US6293852B1Sep 25, 2001
Polishing pads and methods relating thereto
RODEL INC46 citations95
US6231434B1May 15, 2001
Polishing pads and methods relating thereto
RODEL INC44 citations95
US6217434B1Apr 17, 2001
Polishing pads and methods relating thereto
RODEL INC50 citations95
US6354915B1Mar 12, 2002
Polishing pads and methods relating thereto
RODEL INC54 citations94
US6030899AFeb 29, 2000
Apparatus and methods for recirculating chemical-mechanical polishing of semiconductor wafers
RODEL INC21 citations93
US6648733B2Nov 18, 2003
Polishing pads and methods relating thereto
RODEL INC45 citations92
US6425816B1Jul 30, 2002
Polishing pads and methods relating thereto
RODEL INC24 citations92
US6337281B1Jan 8, 2002
Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the like
RODEL INC44 citations92
US6325703B2Dec 4, 2001
Polishing pads and methods relating thereto
RODEL INC23 citations92
US6287185B1Sep 11, 2001
Polishing pads and methods relating thereto
RODEL INC27 citations92
US6284114B1Sep 4, 2001
Method of fabricating a porous polymeric material by electrophoretic deposition
RODEL INC28 citations92
US6106754AAug 22, 2000
Method of making polishing pads
RODEL INC35 citations92
US6500053B2Dec 31, 2002
Polishing pads and methods relating thereto
RODEL INC42 citations91
ROHM & HAAS ELECT MAT
11 patentsUS6848977B1Feb 1, 2005
Polishing pad for electrochemical mechanical polishing
ROHM & HAAS ELECT MAT94 citations98
US7537446B2May 26, 2009
Apparatus for forming a porous reaction injection molded chemical mechanical polishing pad
ROHM & HAAS ELECT MAT32 citations93
US9259820B2Feb 16, 2016
Chemical mechanical polishing pad with polishing layer and window
ROHM & HAAS ELECT MAT36 citations92
US7371160B1May 13, 2008
Elastomer-modified chemical mechanical polishing pad
ROHM & HAAS ELECT MAT52 citations92
US7074115B2Jul 11, 2006
Polishing pad
ROHM & HAAS ELECT MAT38 citations92
US6869350B2Mar 22, 2005
Polishing pads and methods relating thereto
ROHM & HAAS ELECT MAT32 citations92
US8980749B1Mar 17, 2015
Method for chemical mechanical polishing silicon wafers
ROHM & HAAS ELECT MAT24 citations90
US7438636B2Oct 21, 2008
Chemical mechanical polishing pad
ROHM & HAAS ELECT MAT39 citations89
US7618529B2Nov 17, 2009
Polishing pad for electrochemical mechanical polishing
ROHM & HAAS ELECT MAT12 citations84
US7435364B2Oct 14, 2008
Method for forming a porous polishing pad
ROHM & HAAS ELECT MAT15 citations84
US9064806B1Jun 23, 2015
Soft and conditionable chemical mechanical polishing pad with window
ROHM & HAAS ELECT MAT13 citations82
INTEL CORP
2 patentsJAMES DAVID B
2 patentsROHM AND HAAS ELECTRIC MATERIA
1 patentNAT RES DEV
1 patentROHM AND HAAS ELECTRONICS MATE
1 patentXIE JIA
1 patentShowing the top 50 of 70 patents by PatentIndex Score.