Inventor
KAMIKAWA YUJI
JP86 patents
⚠️ This page may combine multiple inventors who share the name “KAMIKAWA YUJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
48 patentsUS6247479B1Jun 19, 2001
Washing/drying process apparatus and washing/drying process method
TOKYO ELECTRON LTD165 citations98
US6164297ADec 26, 2000
Cleaning and drying apparatus for objects to be processed
TOKYO ELECTRON LTD123 citations98
US5940985AAug 24, 1999
Apparatus and method for drying substrates
TOKYO ELECTRON LTD129 citations98
US6029371AFeb 29, 2000
Drying treatment method and apparatus
TOKYO ELECTRON LTD107 citations97
US6575178B1Jun 10, 2003
Cleaning and drying method and apparatus
TOKYO ELECTRON LTD53 citations96
US6299696B2Oct 9, 2001
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD69 citations96
US6158449ADec 12, 2000
Cleaning and drying method and apparatus
TOKYO ELECTRON LTD43 citations96
US6131588AOct 17, 2000
Apparatus for and method of cleaning object to be processed
TOKYO ELECTRON LTD45 citations96
US6119367ASep 19, 2000
System for drying semiconductor wafers using ultrasonic or low frequency vibration
TOKYO ELECTRON LTD54 citations96
US6068002AMay 30, 2000
Cleaning and drying apparatus, wafer processing system and wafer processing method
TOKYO ELECTRON LTD46 citations96
US6050275AApr 18, 2000
Apparatus for and method of cleaning objects to be processed
TOKYO ELECTRON LTD53 citations96
US6009890AJan 4, 2000
Substrate transporting and processing system
TOKYO ELECTRON LTD75 citations96
US5488964AFeb 6, 1996
Washing apparatus, and washing method
TOKYO ELECTRON LTD45 citations95
US6776173B2Aug 17, 2004
Liquid processing apparatus
TOKYO ELECTRON LTD17 citations93
US6589359B2Jul 8, 2003
Cleaning method and cleaning apparatus for substrate
TOKYO ELECTRON LTD43 citations93
US6510859B1Jan 28, 2003
Apparatus and method for cleaning and drying object
TOKYO ELECTRON LTD24 citations93
US5862823AJan 26, 1999
Substrate cleaning method and a substrate cleaning apparatus
TOKYO ELECTRON LTD26 citations93
US5381808AJan 17, 1995
Cleaning treatment apparatus
TOKYO ELECTRON LTD28 citations93
US5213118AMay 25, 1993
Treatment apparatus
TOKYO ELECTRON LTD29 citations93
US8002511B2Aug 23, 2011
Batch forming apparatus, substrate processing system, batch forming method, and storage medium
TOKYO ELECTRON LTD21 citations92
US6746543B2Jun 8, 2004
Apparatus for and method of cleaning objects to be processed
TOKYO ELECTRON LTD23 citations92
US6613692B1Sep 2, 2003
Substrate processing method and apparatus
TOKYO ELECTRON LTD35 citations92
US6491045B2Dec 10, 2002
Apparatus for and method of cleaning object to be processed
TOKYO ELECTRON LTD15 citations92
US6413355B1Jul 2, 2002
Apparatus for and method of cleaning objects to be processed
TOKYO ELECTRON LTD22 citations92
US6394110B2May 28, 2002
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD30 citations92
US6375758B2Apr 23, 2002
Cleaning and drying method and apparatus for objects to be processed
TOKYO ELECTRON LTD23 citations92
US6342104B1Jan 29, 2002
Method of cleaning objects to be processed
TOKYO ELECTRON LTD37 citations92
US6319329B1Nov 20, 2001
Method of cleaning objects to be processed
TOKYO ELECTRON LTD17 citations92
US6241827B1Jun 5, 2001
Method for cleaning a workpiece
TOKYO ELECTRON LTD41 citations92
US6171403B1Jan 9, 2001
Cleaning and drying apparatus, wafer processing system and wafer processing method
TOKYO ELECTRON LTD24 citations92
US6158447ADec 12, 2000
Cleaning method and cleaning equipment
TOKYO ELECTRON LTD44 citations92
US6109278AAug 29, 2000
Liquid treatment method and apparatus
TOKYO ELECTRON LTD32 citations92
US6082381AJul 4, 2000
Treatment apparatus
TOKYO ELECTRON LTD25 citations92
US6045624AApr 4, 2000
Apparatus for and method of cleaning objects to be processed
TOKYO ELECTRON LTD37 citations92
US5922138AJul 13, 1999
Liquid treatment method and apparatus
TOKYO ELECTRON LTD36 citations92
US7593625B2Sep 22, 2009
Fluid heating apparatus
TOKYO ELECTRON LTD25 citations91
US6861371B2Mar 1, 2005
Substrate processing system and substrate processing method
TOKYO ELECTRON LTD48 citations91
US6532975B1Mar 18, 2003
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD25 citations91
US6536452B1Mar 25, 2003
Processing apparatus and processing method
TOKYO ELECTRON LTD28 citations90
US6647642B2Nov 18, 2003
Liquid processing apparatus and method
TOKYO ELECTRON LTD26 citations86
US6792958B2Sep 21, 2004
System for processing substrate with liquid
TOKYO ELECTRON LTD14 citations84
US6698439B2Mar 2, 2004
Processing apparatus with sealing mechanism
TOKYO ELECTRON LTD19 citations84
US6495215B1Dec 17, 2002
Method and apparatus for processing substrate
TOKYO ELECTRON LTD15 citations84
US6357458B2Mar 19, 2002
Cleaning apparatus and cleaning method
TOKYO ELECTRON LTD15 citations83
US7637029B2Dec 29, 2009
Vapor drying method, apparatus and recording medium for use in the method
TOKYO ELECTRON LTD11 citations80
US7337792B2Mar 4, 2008
Liquid processing apparatus and liquid processing method
TOKYO ELECTRON LTD13 citations77
US6725868B2Apr 27, 2004
Liquid processing apparatus
TOKYO ELECTRON LTD10 citations74
US6435199B1Aug 20, 2002
Treatment apparatus
TOKYO ELECTRON LTD13 citations74
KAMIKAWA YUJI
2 patentsShowing the top 50 of 86 patents by PatentIndex Score.