Inventor
INADOMI HIROAKI
JP22 patents
⚠️ This page may combine multiple inventors who share the name “INADOMI HIROAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
17 patentsUS7780438B2Aug 24, 2010
Substrate heating apparatus and method and coating and developing system
TOKYO ELECTRON LTD20 citations92
US7812285B2Oct 12, 2010
Apparatus and method for heating substrate and coating and developing system
TOKYO ELECTRON LTD7 citations73
US9449857B2Sep 20, 2016
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD4 citations72
US10679845B2Jun 9, 2020
Substrate processing apparatus having cooling member
TOKYO ELECTRON LTD5 citations71
US10593571B2Mar 17, 2020
Substrate processing apparatus
TOKYO ELECTRON LTD3 citations68
US11139181B2Oct 5, 2021
Substrate processing apparatus having processing block including liquid processing unit, drying unit, and supply unit adjacent to the transport block
TOKYO ELECTRON LTD4 citations66
US7758340B2Jul 20, 2010
Heating device and heating method
TOKYO ELECTRON LTD4 citations63
US10207349B2Feb 19, 2019
High-pressure container, substrate processing apparatus, and method for manufacturing high-pressure container
TOKYO ELECTRON LTD1 citations62
US12322606B2Jun 3, 2025
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations60
US12057326B2Aug 6, 2024
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations60
US11735439B2Aug 22, 2023
Substrate processing system and method for supplying processing fluid
TOKYO ELECTRON LTD0 citations60
US11482427B2Oct 25, 2022
Substrate processing system and method for supplying processing fluid
TOKYO ELECTRON LTD1 citations60
US11295965B2Apr 5, 2022
Cleaning apparatus and cleaning method of substrate processing apparatus
TOKYO ELECTRON LTD0 citations51
US12283495B2Apr 22, 2025
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations50
US12255081B2Mar 18, 2025
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations50
US11688613B2Jun 27, 2023
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations49
US10867814B2Dec 15, 2020
Liquid processing method, substrate processing apparatus, and storage medium
TOKYO ELECTRON LTD0 citations39
HAYASHI SHINICHI
3 patentsUS8814563B2Aug 26, 2014
Substrate heating apparatus and method and coating and developing system
HAYASHI SHINICHI2 citations62
US8080765B2Dec 20, 2011
Apparatus and method for heating substrate and coating and developing system
HAYASHI SHINICHI4 citations62
US8237092B2Aug 7, 2012
Apparatus and method for heating substrate and coating and developing system
HAYASHI SHINICHI0 citations51