Inventor
FUJII TOSHIHIKO
JP44 patents
⚠️ This page may combine multiple inventors who share the name “FUJII TOSHIHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
14 patentsUS7510820B2Mar 31, 2009
Resist undercoat-forming material and patterning process
SHINETSU CHEMICAL CO24 citations93
US6440646B2Aug 27, 2002
Positive resist composition suitable for lift-off technique and pattern forming method
SHINETSU CHEMICAL CO21 citations92
US6210855B1Apr 3, 2001
Positive resist composition suitable for lift-off technique and pattern forming method
SHINETSU CHEMICAL CO35 citations92
US9372404B2Jun 21, 2016
Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymer
SHINETSU CHEMICAL CO8 citations84
US8652757B2Feb 18, 2014
Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film
SHINETSU CHEMICAL CO12 citations84
US7745104B2Jun 29, 2010
Bottom resist layer composition and patterning process using the same
SHINETSU CHEMICAL CO15 citations84
US6899991B2May 31, 2005
Photo-curable resin composition, patterning process, and substrate protecting film
SHINETSU CHEMICAL CO13 citations84
US7632624B2Dec 15, 2009
Photoresist undercoat-forming material and patterning process
SHINETSU CHEMICAL CO17 citations81
US6867325B2Mar 15, 2005
Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate-protecting coat
SHINETSU CHEMICAL CO10 citations74
US6713612B2Mar 30, 2004
Sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO7 citations74
US9230827B2Jan 5, 2016
Method for forming a resist under layer film and patterning process
SHINETSU CHEMICAL CO4 citations73
US7871761B2Jan 18, 2011
Resist lower layer material, resist lower layer substrate comprising the material and method for forming pattern
SHINETSU CHEMICAL CO5 citations63
US6866982B2Mar 15, 2005
Resist composition and patterning process
SHINETSU CHEMICAL CO2 citations63
US7550247B2Jun 23, 2009
Resist composition and patterning process
SHINETSU CHEMICAL CO1 citations52
NISSAN MOTOR
9 patentsUS4475462AOct 9, 1984
Tiltable hanger apparatus
NISSAN MOTOR29 citations90
US4143587AMar 13, 1979
Apparatus for deforming corrugated fiberboard
NISSAN MOTOR21 citations82
US4124421ANov 7, 1978
Method of producing multi-layered and shaped wall covering material of corrugated cardboard
NISSAN MOTOR26 citations82
US4257840AMar 24, 1981
Hot-press machine with facing layer carrying and setting apparatus
NISSAN MOTOR16 citations74
US4249983AFeb 10, 1981
Method and apparatus for production of laminated and shaped trim panel of corrugated paperboard base
NISSAN MOTOR14 citations74
US4242172ADec 30, 1980
Method of press-forming corrugated paperboard into curved board and apparatus for same
NISSAN MOTOR12 citations74
US4145239AMar 20, 1979
Method and apparatus for production of laminated and shaped wall covering board of corrugated paperboard base
NISSAN MOTOR15 citations74
US4119451AOct 10, 1978
Method of press-forming corrugated paperboard as substrate of curved trim board
NISSAN MOTOR8 citations74
US4242399ADec 30, 1980
Corrugated paperboard for trim board and method of producing the same
NISSAN MOTOR1 citations52
OGIHARA TSUTOMU
5 patentsUS8663898B2Mar 4, 2014
Resist underlayer film composition and patterning process using the same
OGIHARA TSUTOMU7 citations84
US8853031B2Oct 7, 2014
Resist underlayer film composition and patterning process using the same
OGIHARA TSUTOMU5 citations73
US8877422B2Nov 4, 2014
Resist underlayer film composition and patterning process using the same
OGIHARA TSUTOMU3 citations63
US8592956B2Nov 26, 2013
Resist underlayer film composition and patterning process using the same
OGIHARA TSUTOMU2 citations63
US8603732B2Dec 10, 2013
Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process
OGIHARA TSUTOMU1 citations52
FUJITSU LTD
3 patentsFUJITSU TEN LTD
3 patentsHATAKEYAMA JUN
2 patentsYOKOWO SEISAKUSHO KK
2 patentsWATANABE TAKERU
2 patentsUS9076738B2Jul 7, 2015
Composition for resist underlayer film, process for forming resist underlayer film, patterning process, and fullerene derivative
WATANABE TAKERU2 citations62
US8835092B2Sep 16, 2014
Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative
WATANABE TAKERU3 citations62