Inventor
KAWASHIMA HIROKAZU
JP30 patents
⚠️ This page may combine multiple inventors who share the name “KAWASHIMA HIROKAZU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IDEMITSU KOSAN CO
8 patentsUS8384077B2Feb 26, 2013
Field effect transistor using oxide semicondutor and method for manufacturing the same
IDEMITSU KOSAN CO247 citations99
US8981369B2Mar 17, 2015
Field effect transistor using oxide semiconductor and method for manufacturing the same
IDEMITSU KOSAN CO86 citations98
US8791457B2Jul 29, 2014
Oxide semiconductor field effect transistor and method for manufacturing the same
IDEMITSU KOSAN CO52 citations98
US8723175B2May 13, 2014
Oxide semiconductor field effect transistor and method for manufacturing the same
IDEMITSU KOSAN CO60 citations98
US9136338B2Sep 15, 2015
Sputtering target, method for forming amorphous oxide thin film using the same, and method for manufacturing thin film transistor
IDEMITSU KOSAN CO15 citations92
US8871119B2Oct 28, 2014
Composite oxide sintered body and sputtering target comprising same
IDEMITSU KOSAN CO9 citations84
US10833201B2Nov 10, 2020
Semiconductor film comprising an oxide containing in atoms, Sn atoms and Zn atoms
IDEMITSU KOSAN CO3 citations73
US9209257B2Dec 8, 2015
Oxide sintered body and sputtering target
IDEMITSU KOSAN CO1 citations52
YANO KOKI
7 patentsUS8461583B2Jun 11, 2013
Oxide semiconductor field effect transistor and method for manufacturing the same
YANO KOKI81 citations98
US8795554B2Aug 5, 2014
Sputtering target for oxide semiconductor, comprising InGaO3(ZnO) crystal phase and process for producing the sputtering target
YANO KOKI24 citations92
US8753548B2Jun 17, 2014
Composite oxide sintered body and sputtering target comprising same
YANO KOKI18 citations92
US8455371B2Jun 4, 2013
Sputtering target, method for forming amorphous oxide thin film using the same, and method for manufacturing thin film transistor
YANO KOKI33 citations92
US8641932B2Feb 4, 2014
Sintered complex oxide and sputtering target comprising same
YANO KOKI8 citations84
US10644163B2May 5, 2020
Semiconductor film comprising an oxide containing in atoms, Sn atoms and Zn atoms
YANO KOKI4 citations73
US8784699B2Jul 22, 2014
In-Ga-Zn-type oxide, oxide sintered body, and sputtering target
YANO KOKI2 citations62
MITSUBISHI HEAVY IND COMPRESSOR CORP
6 patentsUS10227898B2Mar 12, 2019
Multi-valve steam valve and steam turbine
MITSUBISHI HEAVY IND COMPRESSOR CORP11 citations84
US11333044B2May 17, 2022
Steam turbine, partition member, and method for operating steam turbine
MITSUBISHI HEAVY IND COMPRESSOR CORP0 citations52
US10227894B2Mar 12, 2019
Rotary system
MITSUBISHI HEAVY IND COMPRESSOR CORP0 citations42
US10487658B2Nov 26, 2019
Turning device
MITSUBISHI HEAVY IND COMPRESSOR CORP0 citations41
US10082044B2Sep 25, 2018
Turning apparatus
MITSUBISHI HEAVY IND COMPRESSOR CORP0 citations41
US10443513B2Oct 15, 2019
Emergency shutoff device and emergency shutoff system provided with same
MITSUBISHI HEAVY IND COMPRESSOR CORP0 citations37
INOUE KAZUYOSHI
3 patentsUS8445903B2May 21, 2013
Thin film transistor having a crystalline semiconductor film including indium oxide which contains a hydrogen element and method for manufacturing same
INOUE KAZUYOSHI30 citations92
US9269573B2Feb 23, 2016
Thin film transistor having crystalline indium oxide semiconductor film
INOUE KAZUYOSHI0 citations52
US8664136B2Mar 4, 2014
Indium oxide sintered compact and sputtering target
INOUE KAZUYOSHI0 citations52