Inventor

YANO KOKI

JP62 patents

⚠️ This page may combine multiple inventors who share the name “YANO KOKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YANO KOKI

YANO KOKI

Noncrystalline oxide semiconductor thin film, process for producing the noncrystalline oxide semiconductor thin film, process for producing thin-film transistor, field-effect-transistor, light emitting device, display device, and sputtering target

Semiconductor device, polycrystalline semiconductor thin film, process for producing polycrystalline semiconductor thin film, field effect transistor, and process for producing field effect transistor

Thin film transistor manufacturing method, thin film transistor, thin film transistor substrate and image display apparatus, image display apparatus and semiconductor device

Oxide semiconductor field effect transistor and method for manufacturing the same

Semiconductor device, thin film transistor and a method for producing the same

Semiconductor device, polycrystalline semiconductor thin film, process for producing polycrystalline semiconductor thin film, field effect transistor, and process for producing field effect transistor

In-Ga-Zn-Sn type oxide sinter and target for physical film deposition

Sputtering target for oxide semiconductor, comprising InGaO3(ZnO) crystal phase and process for producing the sputtering target

Composite oxide sintered body and sputtering target comprising same

Field effect transistor, semiconductor device and semiconductor device manufacturing method

Sputtering target, method for forming amorphous oxide thin film using the same, and method for manufacturing thin film transistor

Semiconductor, semiconductor device, complementary transistor circuit device

Sputtering target, transparent conductive film, and transparent electrode for touch panel

Sintered complex oxide and sputtering target comprising same

In—Ga—Zn—O type sputtering target

Sputtering target and thin film transistor equipped with same

Modified polyolefin resin for glass fiber treatment, surface-treated glass fiber, and fiber-reinforced polyolefin resin

In—Ga—Zn type oxide sputtering target

Sputtering target, transparent conductive film and transparent electrode

Semiconductor film comprising an oxide containing in atoms, Sn atoms and Zn atoms

In-Ga-Zn-type oxide, oxide sintered body, and sputtering target

IDEMITSU KOSAN CO

Field effect transistor using oxide semicondutor and method for manufacturing the same

Semiconductor thin film, method for manufacturing the same, thin film transistor, and active-matrix-driven display panel

Field effect transistor using oxide semiconductor and method for manufacturing the same

Oxide semiconductor field effect transistor and method for manufacturing the same

Oxide semiconductor field effect transistor and method for manufacturing the same

TFT substrate and method for manufacturing TFT substrate

TFT substrate and method for manufacturing TFT substrate

Semiconductor thin film and method for manufacturing same, and thin film transistor

Sputtering target, method for forming amorphous oxide thin film using the same, and method for manufacturing thin film transistor

In Sm oxide sputtering target

Composite oxide sintered body and sputtering target comprising same

Sputtering target, transparent conductive film and transparent electrode

Semiconductor film comprising an oxide containing in atoms, Sn atoms and Zn atoms

Sputtering target, transparent conductive film and transparent electrode

Sputtering target, transparent conductive film and transparent electrode

Oxide semiconductor substrate and schottky barrier diode

INOUE KAZUYOSHI

Sputtering target, oxide semiconductor film and semiconductor device

Sputtering target, oxide semiconductor film and semiconductor device

TFT substrate and method for producing TFT substrate

Sputtering target and oxide semiconductor film

Field-effect transistor, and process for producing field-effect transistor

Thin film transistor having a crystalline semiconductor film including indium oxide which contains a hydrogen element and method for manufacturing same

TFT substrate and TFT substrate manufacturing method

KAWASHIMA HIROKAZU

Sputtering target for oxide thin film and process for producing the sputtering target

UTSUNO FUTOSHI

Oxide sintered body and sputtering target

EBATA KAZUAKI

Laminate structure including oxide semiconductor thin film layer, and thin film transistor

PRIME POLYMER CO LTD

Method for producing fiber-reinforced resin composition

ITOSE MASAYUKI

In2O3—SnO2—ZnO sputtering target

TOMAI SHIGEKAZU

Sintered material, and process for producing same