Inventor
NAKAI HIDEYUKI
JP9 patents
⚠️ This page may combine multiple inventors who share the name “NAKAI HIDEYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KONISHIROKU PHOTO IND
3 patentsUS5279917AJan 18, 1994
Light-sensitive composition comprising a fluorine copolymer surfactant
KONISHIROKU PHOTO IND15 citations73
US5238771AAug 24, 1993
Lithographic printing plate utilizing aluminum substrate with photosensitive layer containing o-naphthoquinonediazide sulfonic acid ester, alkali soluble resin and select additive
KONISHIROKU PHOTO IND14 citations72
US5110710AMay 5, 1992
Light-sensitive lithographic printing plate wherein the support is treated with an aqueous solution containing nitrites
KONISHIROKU PHOTO IND4 citations57
MITSUBISHI CHEM IND
2 patentsUS5182183AJan 26, 1993
Positive photosensitive planographic printing plates containing specific high-molecular weight compound and photosensitive ester of O-napthoquinonediazidosulfonic acid with polyhydroxybenzophenone
MITSUBISHI CHEM IND7 citations73
US5219700AJun 15, 1993
Photosensitive composition containing 1,2-naphthoquinone-2-diazido-4-sulfonic acid ester, alkali-soluble resin, halomethyloxadiazole compound and a dye
MITSUBISHI CHEM IND12 citations72