Inventor
IKEUCHI TOSHIYUKI
JP19 patents
⚠️ This page may combine multiple inventors who share the name “IKEUCHI TOSHIYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
12 patentsUS6869892B1Mar 22, 2005
Method of oxidizing work pieces and oxidation system
TOKYO ELECTRON LTD43 citations90
US7674724B2Mar 9, 2010
Oxidizing method and oxidizing unit for object to be processed
TOKYO ELECTRON LTD9 citations83
US7605095B2Oct 20, 2009
Heat processing method and apparatus for semiconductor process
TOKYO ELECTRON LTD8 citations83
US7419550B2Sep 2, 2008
Oxidizing method and oxidizing unit of object for object to be processed
TOKYO ELECTRON LTD13 citations83
US7304003B2Dec 4, 2007
Oxidizing method and oxidizing unit for object to be processed
TOKYO ELECTRON LTD11 citations83
US7125811B2Oct 24, 2006
Oxidation method for semiconductor process
TOKYO ELECTRON LTD3 citations63
US7926445B2Apr 19, 2011
Oxidizing method and oxidizing unit for object to be processed
TOKYO ELECTRON LTD2 citations62
US7625604B2Dec 1, 2009
Heat treatment method and heat treatment apparatus
TOKYO ELECTRON LTD5 citations61
US9472394B2Oct 18, 2016
Method of forming silicon oxide film
TOKYO ELECTRON LTD0 citations52
US12018370B2Jun 25, 2024
Film-forming method and film-forming apparatus
TOKYO ELECTRON LTD0 citations51
US10636649B2Apr 28, 2020
Method and apparatus for forming silicon oxide film on tungsten film
TOKYO ELECTRON LTD0 citations49
US9472393B2Oct 18, 2016
Method and apparatus for forming silicon oxide film
TOKYO ELECTRON LTD0 citations41
IKEUCHI TOSHIYUKI
3 patentsUS8461059B2Jun 11, 2013
Batch CVD method and apparatus for semiconductor process
IKEUCHI TOSHIYUKI3 citations60
US8658247B2Feb 25, 2014
Film deposition method
IKEUCHI TOSHIYUKI1 citations49
US8642486B2Feb 4, 2014
Thin film forming method, thin film forming apparatus, and program
IKEUCHI TOSHIYUKI1 citations45