Inventor
HASEBE KAZUHIDE
JP97 patents
⚠️ This page may combine multiple inventors who share the name “HASEBE KAZUHIDE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
36 patentsUS8357619B2Jan 22, 2013
Film formation method for forming silicon-containing insulating film
TOKYO ELECTRON LTD49 citations98
US7923378B2Apr 12, 2011
Film formation method and apparatus for forming silicon-containing insulating film
TOKYO ELECTRON LTD61 citations98
US7758920B2Jul 20, 2010
Method and apparatus for forming silicon-containing insulating film
TOKYO ELECTRON LTD81 citations98
US7651730B2Jan 26, 2010
Method and apparatus for forming silicon oxide film
TOKYO ELECTRON LTD90 citations98
US7648895B2Jan 19, 2010
Vertical CVD apparatus for forming silicon-germanium film
TOKYO ELECTRON LTD337 citations98
US7507676B2Mar 24, 2009
Film formation method and apparatus for semiconductor process
TOKYO ELECTRON LTD79 citations98
US7462571B2Dec 9, 2008
Film formation method and apparatus for semiconductor process for forming a silicon nitride film
TOKYO ELECTRON LTD91 citations98
US7351668B2Apr 1, 2008
Film formation method and apparatus for semiconductor process
TOKYO ELECTRON LTD96 citations98
US7300885B2Nov 27, 2007
Film formation apparatus and method for semiconductor process
TOKYO ELECTRON LTD91 citations98
US8034673B2Oct 11, 2011
Film formation method and apparatus for forming silicon-containing insulating film doped with metal
TOKYO ELECTRON LTD74 citations97
US7220461B2May 22, 2007
Method and apparatus for forming silicon oxide film
TOKYO ELECTRON LTD66 citations97
US7964241B2Jun 21, 2011
Film formation method and apparatus for semiconductor process
TOKYO ELECTRON LTD75 citations95
US7906168B2Mar 15, 2011
Film formation method and apparatus for forming silicon oxide film
TOKYO ELECTRON LTD50 citations94
US6599845B2Jul 29, 2003
Oxidizing method and oxidation system
TOKYO ELECTRON LTD31 citations92
US6313047B2Nov 6, 2001
MOCVD method of tantalum oxide film
TOKYO ELECTRON LTD27 citations92
US6344387B1Feb 5, 2002
Wafer boat and film formation method
TOKYO ELECTRON LTD28 citations90
US6156121ADec 5, 2000
Wafer boat and film formation method
TOKYO ELECTRON LTD24 citations90
US5458685AOct 17, 1995
Vertical heat treatment apparatus
TOKYO ELECTRON LTD41 citations89
US5818596AOct 6, 1998
Film thickness measuring apparatus
TOKYO ELECTRON LTD20 citations86
US10176992B2Jan 8, 2019
Mask pattern forming method, fine pattern forming method, and film deposition apparatus
TOKYO ELECTRON LTD5 citations84
US8946065B2Feb 3, 2015
Method of forming seed layer and method of forming silicon-containing thin film
TOKYO ELECTRON LTD9 citations84
US7993705B2Aug 9, 2011
Film formation apparatus and method for using the same
TOKYO ELECTRON LTD15 citations84
US7989354B2Aug 2, 2011
Patterning method
TOKYO ELECTRON LTD9 citations84
US7611995B2Nov 3, 2009
Method for removing silicon oxide film and processing apparatus
TOKYO ELECTRON LTD16 citations84
US7416978B2Aug 26, 2008
Film forming method, film forming system and recording medium
TOKYO ELECTRON LTD14 citations84
US8343594B2Jan 1, 2013
Film formation method and apparatus for semiconductor process
TOKYO ELECTRON LTD8 citations83
US7604010B2Oct 20, 2009
Film formation apparatus and method of using the same
TOKYO ELECTRON LTD13 citations82
US7795158B2Sep 14, 2010
Oxidation method and apparatus for semiconductor process
TOKYO ELECTRON LTD7 citations74
US7713354B2May 11, 2010
Film forming method, film forming system and recording medium
TOKYO ELECTRON LTD6 citations74
US11404271B2Aug 2, 2022
Film deposition apparatus for fine pattern forming
TOKYO ELECTRON LTD2 citations73
US10879066B2Dec 29, 2020
Mask pattern forming method, fine pattern forming method, and film deposition apparatus
TOKYO ELECTRON LTD2 citations73
US9865457B2Jan 9, 2018
Nitride film forming method using nitrading active species
TOKYO ELECTRON LTD6 citations73
US9758865B2Sep 12, 2017
Silicon film forming method, thin film forming method and cross-sectional shape control method
TOKYO ELECTRON LTD4 citations73
US9343292B2May 17, 2016
Stacked semiconductor device, and method and apparatus of manufacturing the same
TOKYO ELECTRON LTD3 citations73
US9263250B2Feb 16, 2016
Method and apparatus of forming silicon nitride film
TOKYO ELECTRON LTD3 citations73
US7273818B2Sep 25, 2007
Film formation method and apparatus for semiconductor process
TOKYO ELECTRON LTD7 citations73
HASEBE KAZUHIDE
3 patentsUS8080290B2Dec 20, 2011
Film formation method and apparatus for semiconductor process
HASEBE KAZUHIDE109 citations97
US8119544B2Feb 21, 2012
Film formation method and apparatus for semiconductor process
HASEBE KAZUHIDE130 citations96
US8426117B2Apr 23, 2013
Mask pattern forming method, fine pattern forming method, and film deposition apparatus
HASEBE KAZUHIDE12 citations92
MATSUNAGA MASANOBU
2 patentsMURAKAMI HIROKI
2 patentsKAKIMOTO AKINOBU
1 patentWATANABE MASAHISA
1 patentYANG LIU
1 patentNODERA NOBUTAKE
1 patentTERAMOTO AKINOBU
1 patentCHOU PAO-HWA
1 patentNAKAJIMA SHIGERU
1 patentShowing the top 50 of 97 patents by PatentIndex Score.