Inventor
AITA MICHITAKA
JP11 patents
Patents
11 patentsUS10665428B2May 26, 2020
Plasma processing apparatus
TOKYO ELECTRON LTD2 citations71
US9761418B2Sep 12, 2017
Plasma processing apparatus
TOKYO ELECTRON LTD4 citations70
US12168825B2Dec 17, 2024
Film formation method and film formation device
TOKYO ELECTRON LTD0 citations59
US10312057B2Jun 4, 2019
Plasma processing apparatus
TOKYO ELECTRON LTD1 citations59
US9574270B2Feb 21, 2017
Plasma processing apparatus
TOKYO ELECTRON LTD1 citations51
US10815568B2Oct 27, 2020
Gas distribution device and processing apparatus
TOKYO ELECTRON LTD0 citations42
US10490443B2Nov 26, 2019
Selective film forming method and method of manufacturing semiconductor device
TOKYO ELECTRON LTD0 citations40
US9646867B2May 9, 2017
Plasma processing apparatus, power supply unit and mounting table system
TOKYO ELECTRON LTD0 citations39
US10504698B2Dec 10, 2019
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations37
US9343270B2May 17, 2016
Plasma processing apparatus
TOKYO ELECTRON LTD0 citations37
US9324542B2Apr 26, 2016
Plasma processing method and plasma processing apparatus
TOKYO ELECTRON LTD0 citations37