Inventor
WU HAN-WEI
TW22 patents
⚠️ This page may combine multiple inventors who share the name “WU HAN-WEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
21 patentsUS10872889B2Dec 22, 2020
Semiconductor component and fabricating method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11961738B2Apr 16, 2024
Method of manufacturing semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US10644134B2May 5, 2020
Gate formation with varying work function layers
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US10115796B2Oct 30, 2018
Method of pulling-back sidewall metal layer
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US11804410B2Oct 31, 2023
Thin-film non-uniform stress evaluation
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations69
US9443768B2Sep 13, 2016
Method of making a FinFET device
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations63
US11387105B2Jul 12, 2022
Loading effect reduction through multiple coat-etch processes
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10488766B2Nov 26, 2019
Lithography system having invisible pellicle over mask
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US12588439B2Mar 24, 2026
Method of manufacturing semiconductor structure with spacer on photoresist layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11996297B2May 28, 2024
Method of manufacturing a semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12581916B2Mar 17, 2026
Etch monitoring and performing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12362180B2Jul 15, 2025
Method of manufacturing semiconductor devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12120886B2Oct 15, 2024
Memory device and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11830936B2Nov 28, 2023
Gate formation with varying work function layers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11749570B2Sep 5, 2023
Etch monitoring and performing
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11239345B2Feb 1, 2022
Gate formation with varying work function layers
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US12374588B2Jul 29, 2025
Method for evaluating non-uniform stress
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations59
US10755936B2Aug 25, 2020
Loading effect reduction through multiple coat-etch processes
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10276392B2Apr 30, 2019
Loading effect reduction through multiple coat-etch processes
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US9711604B1Jul 18, 2017
Loading effect reduction through multiple coat-etch processes
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US11844224B2Dec 12, 2023
Memory structure and method of forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations47