Inventor

RUI XIANGXIN

US47 patents

⚠️ This page may combine multiple inventors who share the name “RUI XIANGXIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

RUI XIANGXIN

INTERMOLECULAR INC

Methods for reproducible flash layer deposition

Methods for reproducible flash layer deposition

High performance dielectric stack for DRAM capacitor

Methods for depositing high-K dielectrics

Methods to improve leakage for ZrO2 based high K MIM capacitor

Methods to improve leakage of high K materials

Inexpensive electrode materials to facilitate rutile phase titanium oxide

Semiconductor stacks including catalytic layers

High performance dielectric stack for DRAM capacitor

Methods for depositing high-K dielectrics

High performance dielectric stack for DRAM capacitor

Methods to improve electrical performance of ZrO2 based high-K dielectric materials for DRAM applications

ZrO-based high K dielectric stack for logic decoupling capacitor or embedded DRAM

Inexpensive electrode materials to facilitate rutile phase titanium oxide

Enhanced work function layer supporting growth of rutile phase titanium oxide

Methods to improve leakage of high K materials

Doped electrodes for DRAM applications

APPLIED MATERIALS INC

Hybrid high-k dielectric material film stacks comprising zirconium oxide utilized in display devices

Hybrid high-k dielectric material film stacks comprising zirconium oxide utilized in display devices

Gas flow guide design for uniform flow distribution and efficient purge

ALD process and hardware with improved purge efficiency

ALD process and hardware with improved purge efficiency

High-K dielectric materials comprising zirconium oxide utilized in display devices

Hybrid high-K dielectric material film stacks comprising zirconium oxide utilized in display devices

High-K dielectric materials comprising zirconium oxide utilized in display devices

Layer stack for display applications

High-k dielectric materials comprising zirconium oxide utilized in display devices

Layer stack for display applications

Selective in-situ cleaning of high-k films from processing chamber using reactive gas precursor

Encapsulating film stacks for OLED applications with desired profile control

Encapsulating film stacks for OLED applications

Encapsulating film stacks for OLED applications

Thin film encapsulation processing system and process kit

CHEN HANHONG

Method of processing MIM capacitors to reduce leakage current

Methods for forming high-K crystalline films and related devices

Method of using a catalytic layer to enhance formation of a capacitor stack

Method of forming stacked metal oxide layers

RUI XIANGXIN

Doped electrode for dram applications

Enhanced work function layer supporting growth of rutile phase titanium oxide

Methods for depositing high-K dielectrics

MALHOTRA SANDRA

High performance dielectric stack for DRAM capacitor

Leakage reduction in DRAM MIM capacitors

MATZ LAURA M

Methods of forming strontium titanate films

Methods of forming strontium titanate films

SHANKER SUNIL

Inexpensive electrode materials to facilitate rutile phase titanium oxide

ELPIDA MEMORY INC

Inexpensive electrode materials to facilitate rutile phase titanium oxide

DEWEERD WIM

Single-sided non-noble metal electrode hybrid MIM stack for DRAM devices