P

Inventor

ZHAI YUJIA

US19 patents
⚠️ This page may combine multiple inventors who share the name “ZHAI YUJIA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

13 patents
US11742362B2Aug 29, 2023

Hybrid high-k dielectric material film stacks comprising zirconium oxide utilized in display devices

APPLIED MATERIALS INC2 citations72
US11145683B2Oct 12, 2021

Hybrid high-k dielectric material film stacks comprising zirconium oxide utilized in display devices

APPLIED MATERIALS INC1 citations72
US12148766B2Nov 19, 2024

High-K dielectric materials comprising zirconium oxide utilized in display devices

APPLIED MATERIALS INC0 citations62
US12080725B2Sep 3, 2024

Hybrid high-K dielectric material film stacks comprising zirconium oxide utilized in display devices

APPLIED MATERIALS INC0 citations62
US12021152B2Jun 25, 2024

Process to reduce plasma induced damage

APPLIED MATERIALS INC0 citations62
US11894396B2Feb 6, 2024

High-K dielectric materials comprising zirconium oxide utilized in display devices

APPLIED MATERIALS INC0 citations62
US11670722B2Jun 6, 2023

Process to reduce plasma induced damage

APPLIED MATERIALS INC0 citations62
US11600642B2Mar 7, 2023

Layer stack for display applications

APPLIED MATERIALS INC0 citations62
US11380801B2Jul 5, 2022

Process to reduce plasma induced damage

APPLIED MATERIALS INC0 citations62
US11239258B2Feb 1, 2022

High-k dielectric materials comprising zirconium oxide utilized in display devices

APPLIED MATERIALS INC0 citations62
US11049887B2Jun 29, 2021

Layer stack for display applications

APPLIED MATERIALS INC0 citations62
US12076763B2Sep 3, 2024

Selective in-situ cleaning of high-k films from processing chamber using reactive gas precursor

APPLIED MATERIALS INC0 citations52
US10804408B2Oct 13, 2020

Process to reduce plasma induced damage

APPLIED MATERIALS INC0 citations51

UNIV HUNAN

4 patents

HONOR DEVICE CO LTD

1 patent

ACCELINK TECH CO LTD

1 patent