Inventor
TADA TSUKASA
JP35 patents
⚠️ This page may combine multiple inventors who share the name “TADA TSUKASA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
21 patentsUS5332648AJul 26, 1994
Potosensitive composition and method of forming a pattern using the same
TOSHIBA KK79 citations94
US5348838ASep 20, 1994
Photosensitive composition comprising alkali soluble binder and photoacid generator having sulfonyl group
TOSHIBA KK39 citations92
US5372914ADec 13, 1994
Pattern forming method
TOSHIBA KK29 citations91
US9054324B2Jun 9, 2015
Organic molecular memory
TOSHIBA KK5 citations84
US7772551B2Aug 10, 2010
Refractive index variable element and method of varying refractive index
TOSHIBA KK15 citations84
US7372067B2May 13, 2008
Refractive index changing apparatus and method
TOSHIBA KK9 citations84
US9548373B2Jan 17, 2017
Nonvolatile semiconductor memory device
TOSHIBA KK2 citations73
US9515195B2Dec 6, 2016
Organic molecular memory
TOSHIBA KK3 citations73
US7738752B2Jun 15, 2010
Optical waveguide system
TOSHIBA KK7 citations73
US5169740ADec 8, 1992
Positive type and negative type ionization irradiation sensitive and/or deep u.v. sensitive resists comprising a halogenated resin binder
TOSHIBA KK13 citations73
US7469083B2Dec 23, 2008
Optical waveguide
TOSHIBA KK7 citations72
US6340552B1Jan 22, 2002
Photosensitive composition containing a dissolution inhibitor and an acid releasing compound
TOSHIBA KK6 citations72
US9450065B2Sep 20, 2016
Nonvolatile semiconductor memory device and method for manufacturing same
TOSHIBA KK2 citations63
US9000504B2Apr 7, 2015
Nonvolatile semiconductor memory device and method for manufacturing same
TOSHIBA KK3 citations63
US7972539B2Jul 5, 2011
Process for producing metallic-nanoparticle inorganic composite and metallic-nanoparticle inorganic composite
TOSHIBA KK2 citations62
US7732806B2Jun 8, 2010
Refractive index variable element
TOSHIBA KK5 citations62
US7471863B2Dec 30, 2008
Near-field interaction control element
TOSHIBA KK2 citations62
US6306553B1Oct 23, 2001
Photosensitive composition and method of forming a pattern using the same
TOSHIBA KK2 citations61
US9588418B2Mar 7, 2017
Pattern forming method
TOSHIBA KK0 citations51
US9550322B2Jan 24, 2017
Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint method
TOSHIBA KK0 citations51
US8945798B2Feb 3, 2015
Near-field exposure mask and pattern forming method
TOSHIBA KK0 citations51