P

Inventor

TADA TSUKASA

JP35 patents
⚠️ This page may combine multiple inventors who share the name “TADA TSUKASA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOSHIBA KK

21 patents
US5332648AJul 26, 1994

Potosensitive composition and method of forming a pattern using the same

TOSHIBA KK79 citations94
US5348838ASep 20, 1994

Photosensitive composition comprising alkali soluble binder and photoacid generator having sulfonyl group

TOSHIBA KK39 citations92
US5372914ADec 13, 1994

Pattern forming method

TOSHIBA KK29 citations91
US9054324B2Jun 9, 2015

Organic molecular memory

TOSHIBA KK5 citations84
US7772551B2Aug 10, 2010

Refractive index variable element and method of varying refractive index

TOSHIBA KK15 citations84
US7372067B2May 13, 2008

Refractive index changing apparatus and method

TOSHIBA KK9 citations84
US9548373B2Jan 17, 2017

Nonvolatile semiconductor memory device

TOSHIBA KK2 citations73
US9515195B2Dec 6, 2016

Organic molecular memory

TOSHIBA KK3 citations73
US7738752B2Jun 15, 2010

Optical waveguide system

TOSHIBA KK7 citations73
US5169740ADec 8, 1992

Positive type and negative type ionization irradiation sensitive and/or deep u.v. sensitive resists comprising a halogenated resin binder

TOSHIBA KK13 citations73
US7469083B2Dec 23, 2008

Optical waveguide

TOSHIBA KK7 citations72
US6340552B1Jan 22, 2002

Photosensitive composition containing a dissolution inhibitor and an acid releasing compound

TOSHIBA KK6 citations72
US9450065B2Sep 20, 2016

Nonvolatile semiconductor memory device and method for manufacturing same

TOSHIBA KK2 citations63
US9000504B2Apr 7, 2015

Nonvolatile semiconductor memory device and method for manufacturing same

TOSHIBA KK3 citations63
US7972539B2Jul 5, 2011

Process for producing metallic-nanoparticle inorganic composite and metallic-nanoparticle inorganic composite

TOSHIBA KK2 citations62
US7732806B2Jun 8, 2010

Refractive index variable element

TOSHIBA KK5 citations62
US7471863B2Dec 30, 2008

Near-field interaction control element

TOSHIBA KK2 citations62
US6306553B1Oct 23, 2001

Photosensitive composition and method of forming a pattern using the same

TOSHIBA KK2 citations61
US9588418B2Mar 7, 2017

Pattern forming method

TOSHIBA KK0 citations51
US9550322B2Jan 24, 2017

Near-field exposure mask, resist pattern forming method, device manufacturing method, near-field exposure method, pattern forming method, near-field optical lithography member, and near-field nanoimprint method

TOSHIBA KK0 citations51
US8945798B2Feb 3, 2015

Near-field exposure mask and pattern forming method

TOSHIBA KK0 citations51

VLSI TECHNOLOGY RES ASS

2 patents

NISHIZAWA HIDEYUKI

1 patent

KABUHSIKI KAISHA TOSHIBA

1 patent

TOKYO SHIBAURA ELECTRIC CO

1 patent

HATTORI SHIGEKI

1 patent

TADA TSUKASA

1 patent

TOSHIBA CERAMICS CO

1 patent

TOSHIBA MEMORY CORP

1 patent

YOSHIDA TAKASHI

1 patent

TODORI KENJI

1 patent

SHIDA NAOMI

1 patent

TERAI MASAYA

1 patent

MARUYAMA MIHO

1 patent