Inventor
OHNO HAYATO
JP4 patents
Patents
4 patentsUS5604077AFeb 18, 1997
Positive-working photoresist composition comprising a novolac resin made in butyrolactone as a solvent
TOKYO OHKA KOGYO CO LTD11 citations73
US5332647AJul 26, 1994
Positive-working quinone diazide composition containing N,N',N"-substituted isocyanurate compound and associated article
TOKYO OHKA KOGYO CO LTD9 citations72
US5702862ADec 30, 1997
Positive photoresist coating solution comprising a mixed solvent of propylene glycol monopropyl ether and 2-heptanone
TOKYO OHKA KOGYO CO LTD6 citations71
US6083657AJul 4, 2000
Positive photoresist compositions and a process for producing the same
TOKYO OHKA KOGYO CO LTD2 citations62