Inventor
TAKIGUCHI YASUSHI
JP31 patents
⚠️ This page may combine multiple inventors who share the name “TAKIGUCHI YASUSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
25 patentsUSD610176SFeb 16, 2010
Coater cup
TOKYO ELECTRON LTD37 citations90
US7959988B2Jun 14, 2011
Coating film forming apparatus and method
TOKYO ELECTRON LTD8 citations84
US11554389B2Jan 17, 2023
Substrate cleaning apparatus and substrate cleaning method
TOKYO ELECTRON LTD2 citations72
US9947556B2Apr 17, 2018
Substrate cleaning apparatus, substrate cleaning method, and storage medium
TOKYO ELECTRON LTD5 citations72
US9716002B2Jul 25, 2017
Substrate cleaning method
TOKYO ELECTRON LTD3 citations72
US10168618B2Jan 1, 2019
Liquid processing method and storage medium
TOKYO ELECTRON LTD5 citations71
US9869941B2Jan 16, 2018
Substrate cleaning method, substrate cleaning apparatus, and computer-readable storage medium
TOKYO ELECTRON LTD2 citations71
US9570326B2Feb 14, 2017
Substrate cleaning method, substrate cleaning apparatus, and computer-readable storage medium
TOKYO ELECTRON LTD2 citations71
US11059145B2Jul 13, 2021
Dressing apparatus and dressing method for substrate rear surface polishing member
TOKYO ELECTRON LTD2 citations69
US10840079B2Nov 17, 2020
Substrate processing apparatus, substrate processing method and storage medium
TOKYO ELECTRON LTD2 citations68
US11532487B2Dec 20, 2022
Substrate processing apparatus
TOKYO ELECTRON LTD0 citations60
US11031261B2Jun 8, 2021
Liquid processing apparatus
TOKYO ELECTRON LTD0 citations60
US12230515B2Feb 18, 2025
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations59
US11887869B2Jan 30, 2024
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations59
US11139182B2Oct 5, 2021
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD1 citations59
US12533715B2Jan 27, 2026
Substrate cleaning apparatus and substrate cleaning method
TOKYO ELECTRON LTD0 citations51
US10289004B2May 14, 2019
Developing apparatus, developing method and storage medium
TOKYO ELECTRON LTD0 citations51
US10120285B2Nov 6, 2018
Developing method, developing apparatus and storage medium
TOKYO ELECTRON LTD0 citations51
US9575411B2Feb 21, 2017
Developing apparatus, developing method and storage medium
TOKYO ELECTRON LTD0 citations51
US9568829B2Feb 14, 2017
Developing method, developing apparatus and storage medium
TOKYO ELECTRON LTD1 citations51
US9470979B2Oct 18, 2016
Developing treatment apparatus and developing treatment method
TOKYO ELECTRON LTD1 citations51
US9304398B2Apr 5, 2016
Developing treatment apparatus and developing treatment method
TOKYO ELECTRON LTD0 citations51
US10014190B2Jul 3, 2018
Liquid processing apparatus
TOKYO ELECTRON LTD0 citations50
US12491600B2Dec 9, 2025
Substrate warpage correction method, computer storage medium, and substrate warpage correction apparatus
TOKYO ELECTRON LTD0 citations47
US10649334B2May 12, 2020
Liquid processing apparatus
TOKYO ELECTRON LTD0 citations35
TAKIGUCHI YASUSHI
4 patentsUS8578953B2Nov 12, 2013
Substrate cleaning apparatus, substrate cleaning method, and computer-readable storage medium
TAKIGUCHI YASUSHI17 citations90
US8337104B2Dec 25, 2012
Developing apparatus, developing method and storage medium
TAKIGUCHI YASUSHI10 citations82
US8262300B2Sep 11, 2012
Coating and developing apparatus, developing method and non-transitory medium
TAKIGUCHI YASUSHI0 citations40
US8636915B2Jan 28, 2014
Liquid processing apparatus and liquid processing method
TAKIGUCHI YASUSHI0 citations36