P

Inventor

NAGAHARA TATSURO

JP24 patents
⚠️ This page may combine multiple inventors who share the name “NAGAHARA TATSURO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

AZ ELECTRONIC MAT LUXEMBOURG SARL

6 patents
US11392035B2Jul 19, 2022

Gap filling composition and pattern forming method using composition containing polymer

AZ ELECTRONIC MAT LUXEMBOURG SARL0 citations62
US10451974B2Oct 22, 2019

Rinse composition, a method for forming resist patterns and a method for making semiconductor devices

AZ ELECTRONIC MAT LUXEMBOURG SARL1 citations57
US11169443B2Nov 9, 2021

Gap filling composition and pattern forming method using low molecular weight compound

AZ ELECTRONIC MAT LUXEMBOURG SARL0 citations52
US10494261B2Dec 3, 2019

Inorganic polysilazane resin

AZ ELECTRONIC MAT LUXEMBOURG SARL0 citations51
US10191380B2Jan 29, 2019

Composition for resist patterning and method for forming pattern using same

AZ ELECTRONIC MAT LUXEMBOURG SARL0 citations51
US9921481B2Mar 20, 2018

Fine resist pattern-forming composition and pattern forming method using same

AZ ELECTRONIC MAT LUXEMBOURG SARL0 citations40

MERCK PATENT GMBH

5 patents
US12077727B2Sep 3, 2024

Semiconductor aqueous composition and use of the same

MERCK PATENT GMBH0 citations59
US10670969B2Jun 2, 2020

Reverse pattern formation composition, reverse pattern formation method, and device formation method

MERCK PATENT GMBH0 citations52
US12570935B2Mar 10, 2026

Substrate cleaning solution, and using the same, method for manufacturing cleaned substrate and method for manufacturing device

MERCK PATENT GMBH0 citations50
US11859152B2Jan 2, 2024

Substrate pattern filling composition and use of the same

MERCK PATENT GMBH0 citations50
US12068150B2Aug 20, 2024

Substrate cleaning solution, and using the same, method for manufacturing cleaned substrate and method for manufacturing device

MERCK PATENT GMBH0 citations44

SCREEN HOLDINGS CO LTD

4 patents
US11211241B2Dec 28, 2021

Substrate processing method and substrate processing apparatus

SCREEN HOLDINGS CO LTD4 citations71
US10792712B2Oct 6, 2020

Substrate processing method and substrate processing apparatus

SCREEN HOLDINGS CO LTD6 citations71
US11901173B2Feb 13, 2024

Substrate processing method

SCREEN HOLDINGS CO LTD0 citations61
US11260431B2Mar 1, 2022

Substrate processing method and substrate processing apparatus

SCREEN HOLDINGS CO LTD1 citations61

TONEN CORP

1 patent
US5177578AJan 5, 1993

Polycrystalline silicon thin film and transistor using the same

TONEN CORP45 citations87

CLARIANT FINANCE BVI LTD

1 patent
US6902875B2Jun 7, 2005

Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof

CLARIANT FINANCE BVI LTD11 citations73

AZ ELECTRONIC MAT (LUXEMBOURG) S A R L

1 patent
US9411232B2Aug 9, 2016

Composition for forming fine resist pattern, and pattern formation method using same

AZ ELECTRONIC MAT (LUXEMBOURG) S A R L3 citations71

NAKAMOTO NAOKO

1 patent
US8969172B2Mar 3, 2015

Method for forming isolation structure

NAKAMOTO NAOKO7 citations71

NAGAHARA TATSURO

1 patent
US8889229B2Nov 18, 2014

Method for formation of siliceous film and siliceous film formed by the method

NAGAHARA TATSURO5 citations66

AZ ELECTRONIC MAT MANUFACTURING JAPAN KK

1 patent
US10000386B2Jun 19, 2018

Method for forming of siliceous film and siliceous film formed using same

AZ ELECTRONIC MAT MANUFACTURING JAPAN KK2 citations65

TAKANO YUSUKE

1 patent
US9165818B2Oct 20, 2015

Method for forming insulating film

TAKANO YUSUKE3 citations54

SHINDE NINAD

1 patent
US9029071B2May 12, 2015

Silicon oxynitride film formation method and substrate equipped with silicon oxynitride film formed thereby

SHINDE NINAD2 citations50

RIDGEFIELD ACQUISITION

1 patent
US11156920B2Oct 26, 2021

Lithography composition, a method for forming resist patterns and a method for making semiconductor devices

RIDGEFIELD ACQUISITION0 citations44