Inventor
KOHL ALEXANDER
DE30 patents
⚠️ This page may combine multiple inventors who share the name “KOHL ALEXANDER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT AG
18 patentsUS7511886B2Mar 31, 2009
Optical beam transformation system and illumination system comprising an optical beam transformation system
ZEISS CARL SMT AG63 citations98
US7193794B2Mar 20, 2007
Adjustment arrangement of an optical element
ZEISS CARL SMT AG29 citations92
US6879379B2Apr 12, 2005
Projection lens and microlithographic projection exposure apparatus
ZEISS CARL SMT AG27 citations92
US6816325B1Nov 9, 2004
Mounting apparatus for an optical element
ZEISS CARL SMT AG26 citations92
US7304717B2Dec 4, 2007
Imaging device in a projection exposure facility
ZEISS CARL SMT AG12 citations91
US7486382B2Feb 3, 2009
Imaging device in a projection exposure machine
ZEISS CARL SMT AG8 citations82
US6943965B2Sep 13, 2005
Method for correcting oscillation-induced imaging errors in an objective
ZEISS CARL SMT AG8 citations74
US6728021B1Apr 27, 2004
Optical component and method of inducing a desired alteration of an optical property therein
ZEISS CARL SMT AG8 citations74
US7710542B2May 4, 2010
Imaging device in a projection exposure machine
ZEISS CARL SMT AG7 citations72
US7079331B2Jul 18, 2006
Device for holding a beam splitter element
ZEISS CARL SMT AG7 citations71
US7027237B2Apr 11, 2006
Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method
ZEISS CARL SMT AG9 citations71
US6963449B2Nov 8, 2005
Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method
ZEISS CARL SMT AG11 citations71
US7656595B2Feb 2, 2010
Adjustment arrangement of an optical element
ZEISS CARL SMT AG1 citations62
US7457059B2Nov 25, 2008
Adjustment arrangement of an optical element
ZEISS CARL SMT AG2 citations62
US6842294B2Jan 11, 2005
Catadioptric objective
ZEISS CARL SMT AG5 citations62
US7170585B2Jan 30, 2007
Projection lens and microlithographic projection exposure apparatus
ZEISS CARL SMT AG0 citations51
US7123427B2Oct 17, 2006
Objective, particularly a projection objective for use in semiconductor lithography
ZEISS CARL SMT AG0 citations49
US7014328B2Mar 21, 2006
Apparatus for tilting a carrier for optical elements
ZEISS CARL SMT AG0 citations42
ZEISS CARL SMT GMBH
6 patentsUS9599904B2Mar 21, 2017
Illumination system for illuminating a mask in a microlithographic exposure apparatus
ZEISS CARL SMT GMBH15 citations92
US10191382B2Jan 29, 2019
Illumination system for illuminating a mask in a microlithographic exposure apparatus
ZEISS CARL SMT GMBH1 citations72
US9310694B2Apr 12, 2016
Illumination system for illuminating a mask in a microlithographic exposure apparatus
ZEISS CARL SMT GMBH3 citations72
US7961294B2Jun 14, 2011
Imaging device in a projection exposure facility
ZEISS CARL SMT GMBH6 citations72
US9470981B2Oct 18, 2016
Microlithographic projection exposure apparatus illumination optics
ZEISS CARL SMT GMBH0 citations52
US9977333B2May 22, 2018
Illumination system for illuminating a mask in a microlithographic exposure apparatus
ZEISS CARL SMT GMBH0 citations51
KOHL ALEXANDER
3 patentsUS9223226B2Dec 29, 2015
Microlithographic projection exposure apparatus illumination optics
KOHL ALEXANDER1 citations61
US9052611B2Jun 9, 2015
Microlithographic projection exposure apparatus illumination optics
KOHL ALEXANDER1 citations61
US8085382B2Dec 27, 2011
Microlithographic projection exposure apparatus illumination optics
KOHL ALEXANDER3 citations61