Inventor
TAKAYASU JUN
JP16 patents
⚠️ This page may combine multiple inventors who share the name “TAKAYASU JUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
11 patentsUS6354913B1Mar 12, 2002
Abrasive and method for polishing semiconductor substrate
TOSHIBA KK42 citations92
US6007696ADec 28, 1999
Apparatus and method for manufacturing electrolytic ionic water and washing method using electroyltic ionic water
TOSHIBA KK33 citations92
US6723226B1Apr 20, 2004
Method and apparatus for forming electrolytic water and apparatus for washing semiconductor substrate using electrolytic water-forming apparatus
TOSHIBA KK33 citations88
US6001238ADec 14, 1999
Method for purifying pure water and an apparatus for the same
TOSHIBA KK18 citations84
US6098638AAug 8, 2000
Method of manufacturing a semiconductor device and an apparatus for manufacturing the same
TOSHIBA KK18 citations83
US9539696B2Jan 10, 2017
Retainer ring, polish apparatus, and polish method
TOSHIBA KK6 citations73
US9502318B2Nov 22, 2016
Polish apparatus, polish method, and method of manufacturing semiconductor device
TOSHIBA KK2 citations62
US7037839B2May 2, 2006
Method for polishing organic film on semiconductor substrate by use of resin particles, and slurry
TOSHIBA KK4 citations62
US9296083B2Mar 29, 2016
Polishing apparatus and polishing method
TOSHIBA KK0 citations52
US8823079B2Sep 2, 2014
Semiconductor device and method for manufacturing same
TOSHIBA KK1 citations52
US6878631B2Apr 12, 2005
Abrasive used for planarization of semiconductor device and method of manufacturing semiconductor device using the abrasive
TOSHIBA KK0 citations51
TOSHIBA MEMORY CORP
4 patentsUS10249518B2Apr 2, 2019
Polishing device and polishing method
TOSHIBA MEMORY CORP10 citations80
US9902038B2Feb 27, 2018
Polishing apparatus, polishing method, and semiconductor manufacturing method
TOSHIBA MEMORY CORP3 citations72
US10441979B2Oct 15, 2019
Cleaning apparatus and cleaning method
TOSHIBA MEMORY CORP0 citations41
US9947555B2Apr 17, 2018
Semiconductor manufacturing apparatus and method of manufacturing semiconductor device
TOSHIBA MEMORY CORP0 citations41