Inventor
SCHNEIDER SONJA
DE23 patents
⚠️ This page may combine multiple inventors who share the name “SCHNEIDER SONJA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
20 patentsUS9939730B2Apr 10, 2018
Optical assembly
ZEISS CARL SMT GMBH7 citations82
US11112543B2Sep 7, 2021
Optical element having a coating for influencing heating radiation and optical arrangement
ZEISS CARL SMT GMBH2 citations73
US10401540B2Sep 3, 2019
Optical element having a coating for influencing heating radiation and optical arrangement
ZEISS CARL SMT GMBH3 citations73
US10061206B2Aug 28, 2018
Projection lens with wave front manipulator and related method and apparatus
ZEISS CARL SMT GMBH3 citations72
US10018907B2Jul 10, 2018
Method of operating a microlithographic projection apparatus
ZEISS CARL SMT GMBH2 citations72
US10048592B2Aug 14, 2018
Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography
ZEISS CARL SMT GMBH4 citations71
US9910364B2Mar 6, 2018
Projection exposure apparatus including at least one mirror
ZEISS CARL SMT GMBH3 citations71
US10001631B2Jun 19, 2018
Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element
ZEISS CARL SMT GMBH6 citations70
US12025818B2Jul 2, 2024
Optical element having a coating for influencing heating radiation and optical arrangement
ZEISS CARL SMT GMBH0 citations62
US9134613B2Sep 15, 2015
Illumination and displacement device for a projection exposure apparatus
ZEISS CARL SMT GMBH3 citations59
US12436473B2Oct 7, 2025
Optical element, optical system, lithography system, and method for operating an optical element
ZEISS CARL SMT GMBH0 citations55
US11415894B2Aug 16, 2022
Projection exposure system for semiconductor lithography having an optical arrangement
ZEISS CARL SMT GMBH1 citations53
US9817316B2Nov 14, 2017
Projection exposure method and projection exposure apparatus for microlithography
ZEISS CARL SMT GMBH1 citations51
US10591825B2Mar 17, 2020
Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography
ZEISS CARL SMT GMBH0 citations50
US9709770B2Jul 18, 2017
Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus
ZEISS CARL SMT GMBH0 citations50
US9348234B2May 24, 2016
Microlithographic apparatus
ZEISS CARL SMT GMBH1 citations50
US9829800B2Nov 28, 2017
System correction from long timescales
ZEISS CARL SMT GMBH0 citations49
US9470872B2Oct 18, 2016
Reflective optical element
ZEISS CARL SMT GMBH1 citations48
US9372411B2Jun 21, 2016
Projection objective of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH1 citations48
US10754132B2Aug 25, 2020
Imaging optical system for microlithography
ZEISS CARL SMT GMBH0 citations41