P

Inventor

PRINTZ WALLACE P

US18 patents
⚠️ This page may combine multiple inventors who share the name “PRINTZ WALLACE P”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

14 patents
US7829269B1Nov 9, 2010

Dual tone development with plural photo-acid generators in lithographic applications

TOKYO ELECTRON LTD32 citations92
US9735026B2Aug 15, 2017

Controlling cleaning of a layer on a substrate using nozzles

TOKYO ELECTRON LTD7 citations83
US10429745B2Oct 1, 2019

Photo-sensitized chemically amplified resist (PS-CAR) simulation

TOKYO ELECTRON LTD3 citations72
US10325779B2Jun 18, 2019

Colloidal silica growth inhibitor and associated method and system

TOKYO ELECTRON LTD4 citations72
US10262880B2Apr 16, 2019

Cover plate for wind mark control in spin coating process

TOKYO ELECTRON LTD4 citations70
US9513556B2Dec 6, 2016

Method and system of process chemical temperature control using an injection nozzle

TOKYO ELECTRON LTD2 citations62
US10916440B2Feb 9, 2021

Process and apparatus for processing a nitride structure without silica deposition

TOKYO ELECTRON LTD0 citations61
US10515820B2Dec 24, 2019

Process and apparatus for processing a nitride structure without silica deposition

TOKYO ELECTRON LTD1 citations61
US10763120B2Sep 1, 2020

Colloidal silica growth inhibitor and associated method and system

TOKYO ELECTRON LTD0 citations51
US10490399B2Nov 26, 2019

Systems and methodologies for vapor phase hydroxyl radical processing of substrates

TOKYO ELECTRON LTD0 citations51
US10096480B2Oct 9, 2018

Method and apparatus for dynamic control of the temperature of a wet etch process

TOKYO ELECTRON LTD0 citations51
US9852920B2Dec 26, 2017

Etch system and method for single substrate processing

TOKYO ELECTRON LTD1 citations51
US10256163B2Apr 9, 2019

Method of treating a microelectronic substrate using dilute TMAH

TOKYO ELECTRON LTD0 citations50
US10062586B2Aug 28, 2018

Chemical fluid processing apparatus and chemical fluid processing method

TOKYO ELECTRON LTD0 citations39

FONSECA CARLOS A

2 patents

BROWN IAN J

2 patents