Inventor
SEKIGUCHI KENJI
JP37 patents
⚠️ This page may combine multiple inventors who share the name “SEKIGUCHI KENJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
25 patentsUS5608943AMar 11, 1997
Apparatus for removing process liquid
TOKYO ELECTRON LTD241 citations99
US5803970ASep 8, 1998
Method of forming a coating film and coating apparatus
TOKYO ELECTRON LTD82 citations96
US5695817ADec 9, 1997
Method of forming a coating film
TOKYO ELECTRON LTD92 citations96
US7806989B2Oct 5, 2010
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD24 citations92
US7364626B2Apr 29, 2008
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD26 citations92
US6432212B1Aug 13, 2002
Substrate washing method
TOKYO ELECTRON LTD35 citations92
US6385805B2May 14, 2002
Scrubbing apparatus
TOKYO ELECTRON LTD55 citations92
US6175983B1Jan 23, 2001
Substrate washing apparatus and method
TOKYO ELECTRON LTD34 citations92
US6554010B1Apr 29, 2003
Substrate cleaning tool, having permeable cleaning head
TOKYO ELECTRON LTD23 citations90
US7837804B2Nov 23, 2010
Substrate cleaning method, substrate cleaning equipment, computer program, and program recording medium
TOKYO ELECTRON LTD10 citations84
US8037891B2Oct 18, 2011
Two-fluid nozzle for cleaning substrate and substrate cleaning apparatus
TOKYO ELECTRON LTD8 citations78
US10734255B2Aug 4, 2020
Substrate cleaning method, substrate cleaning system and memory medium
TOKYO ELECTRON LTD6 citations72
US11306249B2Apr 19, 2022
Substrate processing method, substrate processing device and etching liquid
TOKYO ELECTRON LTD2 citations70
US7010826B2Mar 14, 2006
Substrate cleaning tool and substrate cleaning apparatus
TOKYO ELECTRON LTD2 citations63
US11211281B2Dec 28, 2021
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations62
US8794250B2Aug 5, 2014
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD3 citations62
US7803230B2Sep 28, 2010
Substrate cleaning apparatus, substrate cleaning method, and medium for recording program used for the method
TOKYO ELECTRON LTD5 citations62
US11201050B2Dec 14, 2021
Substrate processing method, recording medium and substrate processing apparatus
TOKYO ELECTRON LTD0 citations61
US12203021B2Jan 21, 2025
Substrate processing device and etching liquid
TOKYO ELECTRON LTD0 citations60
US11049723B2Jun 29, 2021
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD1 citations59
US11865590B2Jan 9, 2024
Substrate cleaning method, processing container cleaning method, and substrate processing device
TOKYO ELECTRON LTD0 citations58
US11504751B2Nov 22, 2022
Substrate cleaning method, processing container cleaning method, and substrate processing device
TOKYO ELECTRON LTD0 citations58
US11538679B2Dec 27, 2022
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations56
US7691210B2Apr 6, 2010
Resist film removing method
TOKYO ELECTRON LTD0 citations52
US12406862B2Sep 2, 2025
Vacuum processing apparatus and oxidizing gas removal method
TOKYO ELECTRON LTD0 citations48
SEKIGUCHI KENJI
3 patentsUS8147617B2Apr 3, 2012
Substrate cleaning method and computer readable storage medium
SEKIGUCHI KENJI8 citations82
US9111967B2Aug 18, 2015
Liquid processing method, liquid processing apparatus and storage medium
SEKIGUCHI KENJI2 citations59
US8137478B2Mar 20, 2012
Substrate processing method and substrate processing apparatus
SEKIGUCHI KENJI0 citations50