Inventor
CHEN PHILIP S H
US33 patents
⚠️ This page may combine multiple inventors who share the name “CHEN PHILIP S H”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ENTEGRIS INC
17 patentsUS9537095B2Jan 3, 2017
Tellurium compounds useful for deposition of tellurium containing materials
ENTEGRIS INC14 citations84
US10186570B2Jan 22, 2019
ALD processes for low leakage current and low equivalent oxide thickness BiTaO films
ENTEGRIS INC9 citations80
US11371138B2Jun 28, 2022
Chemical vapor deposition processes using ruthenium precursor and reducing gas
ENTEGRIS INC2 citations73
US9997362B2Jun 12, 2018
Cobalt CVD
ENTEGRIS INC4 citations73
US11466038B2Oct 11, 2022
Vapor deposition precursor compounds and process of use
ENTEGRIS INC2 citations71
US11987878B2May 21, 2024
Chemical vapor deposition processes using ruthenium precursor and reducing gas
ENTEGRIS INC0 citations63
US9219232B2Dec 22, 2015
Antimony and germanium complexes useful for CVD/ALD of metal thin films
ENTEGRIS INC1 citations63
US11761086B2Sep 19, 2023
Cobalt precursors
ENTEGRIS INC0 citations62
US11560625B2Jan 24, 2023
Vapor deposition of molybdenum using a bis(alkyl-arene) molybdenum precursor
ENTEGRIS INC0 citations62
US12359309B2Jul 15, 2025
Group VI metal deposition process
ENTEGRIS INC0 citations60
US12252787B2Mar 18, 2025
Methods for depositing tungsten or molybdenum films
ENTEGRIS INC0 citations60
US12209105B2Jan 28, 2025
Vapor deposition precursor compounds and process of use
ENTEGRIS INC0 citations60
US11761081B2Sep 19, 2023
Methods for depositing tungsten or molybdenum films
ENTEGRIS INC1 citations60
US11107675B2Aug 31, 2021
CVD Mo deposition by using MoOCl4
ENTEGRIS INC0 citations59
US11476158B2Oct 18, 2022
Cobalt deposition selectivity on copper and dielectrics
ENTEGRIS INC1 citations57
US10793947B2Oct 6, 2020
Alloys of Co to reduce stress
ENTEGRIS INC0 citations52
US12264392B2Apr 1, 2025
Silicon precursor compounds and method for forming silicon-containing films
ENTEGRIS INC0 citations49
ADVANCED TECH MATERIALS
10 patentsUS7838329B2Nov 23, 2010
Antimony and germanium complexes useful for CVD/ALD of metal thin films
ADVANCED TECH MATERIALS55 citations98
US7475588B2Jan 13, 2009
Apparatus and process for sensing fluoro species in semiconductor processing systems
ADVANCED TECH MATERIALS474 citations98
US7296460B2Nov 20, 2007
Apparatus and process for sensing fluoro species in semiconductor processing systems
ADVANCED TECH MATERIALS481 citations98
US7080545B2Jul 25, 2006
Apparatus and process for sensing fluoro species in semiconductor processing systems
ADVANCED TECH MATERIALS495 citations98
US8008117B2Aug 30, 2011
Antimony and germanium complexes useful for CVD/ALD of metal thin films
ADVANCED TECH MATERIALS14 citations92
US7296458B2Nov 20, 2007
Nickel-coated free-standing silicon carbide structure for sensing fluoro or halogen species in semiconductor processing systems, and processes of making and using same
ADVANCED TECH MATERIALS21 citations92
US7228724B2Jun 12, 2007
Apparatus and process for sensing target gas species in semiconductor processing systems
ADVANCED TECH MATERIALS19 citations92
US8796068B2Aug 5, 2014
Tellurium compounds useful for deposition of tellurium containing materials
ADVANCED TECH MATERIALS12 citations84
US8709863B2Apr 29, 2014
Antimony and germanium complexes useful for CVD/ALD of metal thin films
ADVANCED TECH MATERIALS9 citations84
US9034688B2May 19, 2015
Antimony compounds useful for deposition of antimony-containing materials
ADVANCED TECH MATERIALS2 citations60