Inventor
MAUER IV JOHN L
US11 patents
Patents
11 patentsUS4454647AJun 19, 1984
Isolation for high density integrated circuits
IBM121 citations95
US4367119AJan 4, 1983
Planar multi-level metal process with built-in etch stop
IBM78 citations95
US4691435ASep 8, 1987
Method for making Schottky diode having limited area self-aligned guard ring
IBM35 citations92
US4688069AAug 18, 1987
Isolation for high density integrated circuits
IBM53 citations92
US4454646AJun 19, 1984
Isolation for high density integrated circuits
IBM33 citations92
US4447824AMay 8, 1984
Planar multi-level metal process with built-in etch stop
IBM36 citations92
US4222792ASep 16, 1980
Planar deep oxide isolation process utilizing resin glass and E-beam exposure
IBM101 citations92
US4494004AJan 15, 1985
Electron beam system
IBM42 citations90
US5264328ANov 23, 1993
Resist development endpoint detection for X-ray lithography
IBM17 citations73
US4796069AJan 3, 1989
Schottky diode having limited area self-aligned guard ring and method for making same
IBM10 citations73
US4389294AJun 21, 1983
Method for avoiding residue on a vertical walled mesa
IBM17 citations73