P

Inventor

RYZHIKOV LEV

US29 patents
⚠️ This page may combine multiple inventors who share the name “RYZHIKOV LEV”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ASML HOLDING NV

16 patents
US7187430B2Mar 6, 2007

Advanced illumination system for use in microlithography

ASML HOLDING NV10 citations82
US6775069B2Aug 10, 2004

Advanced illumination system for use in microlithography

ASML HOLDING NV18 citations80
US7227613B2Jun 5, 2007

Lithographic apparatus having double telecentric illumination

ASML HOLDING NV8 citations73
US7859647B2Dec 28, 2010

Lithographic apparatus and device manufacturing method

ASML HOLDING NV7 citations71
US12523941B2Jan 13, 2026

Lithographic pre-alignment imaging sensor with build-in coaxial illumination

ASML HOLDING NV0 citations62
US11960216B2Apr 16, 2024

Invariable magnification multilevel optical device with telecentric converter

ASML HOLDING NV0 citations62
US11754935B2Sep 12, 2023

Lithographic patterning device multichannel position and level gauge

ASML HOLDING NV0 citations62
US7859756B2Dec 28, 2010

Optical system for transforming numerical aperture

ASML HOLDING NV3 citations62
US7532403B2May 12, 2009

Optical system for transforming numerical aperture

ASML HOLDING NV2 citations62
US7289277B2Oct 30, 2007

Relay lens used in an illumination system of a lithography system

ASML HOLDING NV3 citations62
US9411244B2Aug 9, 2016

Optical system, inspection system and manufacturing method

ASML HOLDING NV2 citations61
US8013979B2Sep 6, 2011

Illumination system with low telecentricity error and dynamic telecentricity correction

ASML HOLDING NV2 citations61
US7630136B2Dec 8, 2009

Optical integrators for lithography systems and methods

ASML HOLDING NV3 citations56
US9671337B2Jun 6, 2017

High numerical aperture objective lens system

ASML HOLDING NV0 citations52
US9513559B2Dec 6, 2016

High numerical aperture objective lens system

ASML HOLDING NV0 citations52
US7365848B2Apr 29, 2008

System and method using visible and infrared light to align and measure alignment patterns on multiple layers

ASML HOLDING NV6 citations52

NIKON CORP

3 patents

ASML NETHERLANDS BV

2 patents

VISSER HUIBERT

2 patents

SILICON VALLEY GROUP

1 patent

(unassigned)

1 patent

VLADIMIRSKY YULI

1 patent

ASML HOLDINGS N V

1 patent

SMIRNOV STANISLAV Y

1 patent

RYZHIKOV LEV

1 patent