Inventor
MUNGEKAR HEMANT P
US13 patents
⚠️ This page may combine multiple inventors who share the name “MUNGEKAR HEMANT P”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
12 patentsUS7678715B2Mar 16, 2010
Low wet etch rate silicon nitride film
APPLIED MATERIALS INC516 citations99
US7628897B2Dec 8, 2009
Reactive ion etching for semiconductor device feature topography modification
APPLIED MATERIALS INC230 citations98
US7799704B2Sep 21, 2010
Gas baffle and distributor for semiconductor processing chamber
APPLIED MATERIALS INC15 citations84
US7740706B2Jun 22, 2010
Gas baffle and distributor for semiconductor processing chamber
APPLIED MATERIALS INC19 citations84
US7867921B2Jan 11, 2011
Reduction of etch-rate drift in HDP processes
APPLIED MATERIALS INC7 citations83
US7745350B2Jun 29, 2010
Impurity control in HDP-CVD DEP/ETCH/DEP processes
APPLIED MATERIALS INC13 citations83
US7229931B2Jun 12, 2007
Oxygen plasma treatment for enhanced HDP-CVD gapfill
APPLIED MATERIALS INC16 citations81
US10636630B2Apr 28, 2020
Processing chamber and method with thermal control
APPLIED MATERIALS INC2 citations73
US7704897B2Apr 27, 2010
HDP-CVD SiON films for gap-fill
APPLIED MATERIALS INC7 citations68
US7329586B2Feb 12, 2008
Gapfill using deposition-etch sequence
APPLIED MATERIALS INC6 citations62
US10777394B2Sep 15, 2020
Virtual sensor for chamber cleaning endpoint
APPLIED MATERIALS INC0 citations45
US12203828B2Jan 21, 2025
Method and system for detecting anomalies in a semiconductor processing system
APPLIED MATERIALS INC0 citations43