Inventor

BERTHOLD HEIKE

DE7 patents

⚠️ This page may combine multiple inventors who share the name “BERTHOLD HEIKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FROHBERG KAI

2 patents

US8470661B2Jun 25, 2013

High-K gate electrode structure formed after transistor fabrication by using a spacer

FROHBERG KAI8 citations82

US9006114B2Apr 14, 2015

Method for selectively removing a spacer in a dual stress liner approach

FROHBERG KAI0 citations50

ADVANCED MICRO DEVICES INC

2 patents

US8883582B2Nov 11, 2014

High-K gate electrode structure formed after transistor fabrication by using a spacer

ADVANCED MICRO DEVICES INC0 citations51

US8349744B2Jan 8, 2013

Double deposition of a stress-inducing layer in an interlayer dielectric with intermediate stress relaxation in a semiconductor device

ADVANCED MICRO DEVICES INC0 citations51

CHUMAKOV DMYTRO

1 patent

US8497583B2Jul 30, 2013

Stress reduction in chip packaging by a stress compensation region formed around the chip

CHUMAKOV DMYTRO7 citations82

GRIEBENOW UWE

1 patent

US8440534B2May 14, 2013

Threshold adjustment for MOS devices by adapting a spacer width prior to implantation

GRIEBENOW UWE2 citations61

GLOBALFOUNDRIES INC

1 patent

US8361844B2Jan 29, 2013

Method for adjusting the height of a gate electrode in a semiconductor device

GLOBALFOUNDRIES INC1 citations51