Inventor
INABE HARUKI
JP30 patents
⚠️ This page may combine multiple inventors who share the name “INABE HARUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJIFILM CORP
21 patentsUS7700260B2Apr 20, 2010
Pattern forming method
FUJIFILM CORP58 citations98
US8039197B2Oct 18, 2011
Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
FUJIFILM CORP11 citations92
US7611820B2Nov 3, 2009
Positive resist composition and pattern-forming method using the same
FUJIFILM CORP20 citations92
US7531287B2May 12, 2009
Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
FUJIFILM CORP20 citations92
US9316912B2Apr 19, 2016
Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
FUJIFILM CORP3 citations84
US7892722B2Feb 22, 2011
Pattern forming method
FUJIFILM CORP9 citations84
US8828643B2Sep 9, 2014
Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
FUJIFILM CORP3 citations74
US9541831B2Jan 10, 2017
Positive resist composition and method of pattern formation with the same
FUJIFILM CORP1 citations63
US7842452B2Nov 30, 2010
Pattern forming method
FUJIFILM CORP2 citations63
US7820748B2Oct 26, 2010
Insulating film forming composition and electronic device
FUJIFILM CORP3 citations63
US7803511B2Sep 28, 2010
Positive resist composition for immersion exposure and pattern-forming method using the same
FUJIFILM CORP5 citations63
US7772344B2Aug 10, 2010
Insulating film-forming composition
FUJIFILM CORP2 citations63
US7645557B2Jan 12, 2010
Positive resist composition for immersion exposure and pattern forming method using the same
FUJIFILM CORP4 citations63
US7482112B2Jan 27, 2009
Pattern forming method
FUJIFILM CORP2 citations63
US12111487B2Oct 8, 2024
Color filter, solid-state imaging element, and image display device
FUJIFILM CORP0 citations62
US11746239B2Sep 5, 2023
Coloring composition, film, color filter, solid-state imaging element, and image display device
FUJIFILM CORP0 citations52
US9835945B2Dec 5, 2017
Positive resist composition and method of pattern formation with the same
FUJIFILM CORP0 citations52
US9798235B2Oct 24, 2017
Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
FUJIFILM CORP0 citations52
US9703196B2Jul 11, 2017
Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
FUJIFILM CORP0 citations52
US9465292B2Oct 11, 2016
Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
FUJIFILM CORP0 citations52
US7906268B2Mar 15, 2011
Positive resist composition for immersion exposure and pattern-forming method using the same
FUJIFILM CORP1 citations52
KANDA HIROMI
3 patentsUS8426109B2Apr 23, 2013
Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
KANDA HIROMI12 citations92
US8871421B2Oct 28, 2014
Positive resist composition and method of pattern formation with the same
KANDA HIROMI10 citations79
US9057952B2Jun 16, 2015
Positive resist composition and method of pattern formation with the same
KANDA HIROMI1 citations62
ITO JUNICHI
2 patentsUS8778235B2Jul 15, 2014
Colorant multimer, colored curable composition, color filter and method for producing the same, and solid-state image sensor, image display device, liquid crystal display device and organic EL display with the color filter
ITO JUNICHI7 citations72
US8815478B2Aug 26, 2014
Colored curable composition, resist liquid, ink for inkjet printing, color filter, method of producing color filter, solid-state image sensor, liquid crystal display, organic EL display, image display device and colorant compound
ITO JUNICHI0 citations41