P

Inventor

WATANABE OSAMU

JP285 patents
⚠️ This page may combine multiple inventors who share the name “WATANABE OSAMU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHINETSU CHEMICAL CO

17 patents
US6312867B1Nov 6, 2001

Ester compounds, polymers, resist compositions and patterning process

SHINETSU CHEMICAL CO209 citations99
US6280898B1Aug 28, 2001

Lactone-containing compounds, polymers, resist compositions, and patterning method

SHINETSU CHEMICAL CO229 citations99
US5942367AAug 24, 1999

Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group

SHINETSU CHEMICAL CO91 citations99
US4803243AFeb 7, 1989

Block-graft copolymer

SHINETSU CHEMICAL CO372 citations99
US5691396ANov 25, 1997

Polysiloxane compounds and positive resist compositions

SHINETSU CHEMICAL CO72 citations96
US6746817B2Jun 8, 2004

Resist composition and patterning process

SHINETSU CHEMICAL CO49 citations93
US6455223B1Sep 24, 2002

Resist compositions and patterning process

SHINETSU CHEMICAL CO28 citations93
US6414101B1Jul 2, 2002

Dendritic polymers and making method

SHINETSU CHEMICAL CO20 citations93
US6312869B1Nov 6, 2001

Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group

SHINETSU CHEMICAL CO20 citations93
US6114462ASep 5, 2000

Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group

SHINETSU CHEMICAL CO28 citations93
US6106993AAug 22, 2000

Chemically amplified positive resist composition

SHINETSU CHEMICAL CO44 citations93
US6027854AFeb 22, 2000

Polymers chemically amplified positive resist compositions, and patterning method

SHINETSU CHEMICAL CO21 citations93
US7501223B2Mar 10, 2009

Polymer, resist composition and patterning process using the same

SHINETSU CHEMICAL CO20 citations92
US6156477ADec 5, 2000

Polymers and chemically amplified positive resist compositions

SHINETSU CHEMICAL CO33 citations92
US6033828AMar 7, 2000

Partially hydrogenated polymers and chemically amplified positive resist compositions

SHINETSU CHEMICAL CO23 citations92
US6022665AFeb 8, 2000

Polymers and chemically amplified positive resist compositions

SHINETSU CHEMICAL CO20 citations92
US5844057ADec 1, 1998

Polymers and chemically amplified positive resist compositions

SHINETSU CHEMICAL CO31 citations92

HITACHI CHEMICAL CO LTD

6 patents

CANON KK

4 patents

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

4 patents

TOKYO R & D KK

2 patents

TOSHIBA KK

2 patents

PIONEER ELECTRONIC CORP

2 patents

HITACHI MAXELL

2 patents

KOKUSAI ELECTRIC CO LTD

1 patent

HITACHI CONSTRUCTION MACHINERY

1 patent

TOKUDA SEISAKUSHO

1 patent

OKI DATA KK

1 patent

NIPPON CONCRETE IND CO LTD

1 patent

IBIDEN CO LTD

1 patent

SONY CORP

1 patent

TAKEDA TAKANOBU

1 patent

JTEKT CORP

1 patent

TOYODA MACHINE WORKS LTD

1 patent

TAMURA SEISAKUSHO KK

1 patent

Showing the top 50 of 285 patents by PatentIndex Score.