P

Inventor

HAMMOND IV EDWARD P

US23 patents
⚠️ This page may combine multiple inventors who share the name “HAMMOND IV EDWARD P”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

19 patents
US7264688B1Sep 4, 2007

Plasma reactor apparatus with independent capacitive and toroidal plasma sources

APPLIED MATERIALS INC73 citations97
US7780864B2Aug 24, 2010

Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution

APPLIED MATERIALS INC21 citations92
US7645357B2Jan 12, 2010

Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency

APPLIED MATERIALS INC40 citations92
US7674394B2Mar 9, 2010

Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distribution

APPLIED MATERIALS INC17 citations84
US7686926B2Mar 30, 2010

Multi-step process for forming a metal barrier in a sputter reactor

APPLIED MATERIALS INC16 citations83
US10748797B2Aug 18, 2020

Plasma parameters and skew characterization by high speed imaging

APPLIED MATERIALS INC2 citations72
US12531206B2Jan 20, 2026

Electrostatic chuck with multiple radio frequency meshes to control plasma uniformity

APPLIED MATERIALS INC0 citations62
US12136536B2Nov 5, 2024

Electrostatic chuck with multiple radio frequency meshes to control plasma uniformity

APPLIED MATERIALS INC0 citations62
US11908662B2Feb 20, 2024

Device and method for tuning plasma distribution using phase control

APPLIED MATERIALS INC0 citations62
US7727413B2Jun 1, 2010

Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density

APPLIED MATERIALS INC5 citations62
US11545376B2Jan 3, 2023

Plasma parameters and skew characterization by high speed imaging

APPLIED MATERIALS INC0 citations61
US10923334B2Feb 16, 2021

Selective deposition of hardmask

APPLIED MATERIALS INC0 citations60
US11569072B2Jan 31, 2023

RF grounding configuration for pedestals

APPLIED MATERIALS INC0 citations59
US12136549B2Nov 5, 2024

Plasma-enhanced chemical vapor deposition of carbon hard-mask

APPLIED MATERIALS INC0 citations58
US11434569B2Sep 6, 2022

Ground path systems for providing a shorter and symmetrical ground path

APPLIED MATERIALS INC0 citations52
US10395893B2Aug 27, 2019

Dual-feed tunable plasma source

APPLIED MATERIALS INC0 citations52
US10109462B2Oct 23, 2018

Dual radio-frequency tuner for process control of a plasma process

APPLIED MATERIALS INC1 citations52
US8017526B2Sep 13, 2011

Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch process

APPLIED MATERIALS INC1 citations50
US11626853B2Apr 11, 2023

RF power delivery architecture with switchable match and frequency tuning

APPLIED MATERIALS INC0 citations44

GUNG TZA-JING

1 patent

KATZ DAN

1 patent

BELEN RODOLFO P

1 patent

BAEK JONGHOON

1 patent