Inventor
HAMMOND IV EDWARD P
US23 patents
⚠️ This page may combine multiple inventors who share the name “HAMMOND IV EDWARD P”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
19 patentsUS7264688B1Sep 4, 2007
Plasma reactor apparatus with independent capacitive and toroidal plasma sources
APPLIED MATERIALS INC73 citations97
US7780864B2Aug 24, 2010
Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution
APPLIED MATERIALS INC21 citations92
US7645357B2Jan 12, 2010
Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency
APPLIED MATERIALS INC40 citations92
US7674394B2Mar 9, 2010
Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distribution
APPLIED MATERIALS INC17 citations84
US7686926B2Mar 30, 2010
Multi-step process for forming a metal barrier in a sputter reactor
APPLIED MATERIALS INC16 citations83
US10748797B2Aug 18, 2020
Plasma parameters and skew characterization by high speed imaging
APPLIED MATERIALS INC2 citations72
US12531206B2Jan 20, 2026
Electrostatic chuck with multiple radio frequency meshes to control plasma uniformity
APPLIED MATERIALS INC0 citations62
US12136536B2Nov 5, 2024
Electrostatic chuck with multiple radio frequency meshes to control plasma uniformity
APPLIED MATERIALS INC0 citations62
US11908662B2Feb 20, 2024
Device and method for tuning plasma distribution using phase control
APPLIED MATERIALS INC0 citations62
US7727413B2Jun 1, 2010
Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density
APPLIED MATERIALS INC5 citations62
US11545376B2Jan 3, 2023
Plasma parameters and skew characterization by high speed imaging
APPLIED MATERIALS INC0 citations61
US10923334B2Feb 16, 2021
Selective deposition of hardmask
APPLIED MATERIALS INC0 citations60
US11569072B2Jan 31, 2023
RF grounding configuration for pedestals
APPLIED MATERIALS INC0 citations59
US12136549B2Nov 5, 2024
Plasma-enhanced chemical vapor deposition of carbon hard-mask
APPLIED MATERIALS INC0 citations58
US11434569B2Sep 6, 2022
Ground path systems for providing a shorter and symmetrical ground path
APPLIED MATERIALS INC0 citations52
US10395893B2Aug 27, 2019
Dual-feed tunable plasma source
APPLIED MATERIALS INC0 citations52
US10109462B2Oct 23, 2018
Dual radio-frequency tuner for process control of a plasma process
APPLIED MATERIALS INC1 citations52
US8017526B2Sep 13, 2011
Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch process
APPLIED MATERIALS INC1 citations50
US11626853B2Apr 11, 2023
RF power delivery architecture with switchable match and frequency tuning
APPLIED MATERIALS INC0 citations44