Inventor
LU CHI-TA
TW19 patents
⚠️ This page may combine multiple inventors who share the name “LU CHI-TA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
16 patentsUS10877380B1Dec 29, 2020
Using inverse lithography technology in a method of mask data preparation for generating integrated circuit
TAIWAN SEMICONDUCTOR MFG CO LTD14 citations77
US11429019B2Aug 30, 2022
Method for manufacturing semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10866508B2Dec 15, 2020
Method for manufacturing photomask and semiconductor manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10784196B2Sep 22, 2020
Semiconductor structure and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US11402743B2Aug 2, 2022
Mask defect prevention
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations71
US12293969B2May 6, 2025
Semiconductor structure and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12254258B2Mar 18, 2025
Critical dimension uniformity
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11763057B2Sep 19, 2023
Critical dimension uniformity
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11476193B2Oct 18, 2022
Semiconductor structure and manufacturing method thereof
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11055464B2Jul 6, 2021
Critical dimension uniformity
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12174529B2Dec 24, 2024
Method for manufacturing semiconductor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12124163B2Oct 22, 2024
Mask defect prevention
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11860530B2Jan 2, 2024
Mask defect prevention
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11900040B2Feb 13, 2024
Method and system for reducing layout distortion due to exposure non-uniformity
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations58
US11308254B2Apr 19, 2022
Method and system for reducing layout distortion due to exposure non-uniformity
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations58
US11209728B2Dec 28, 2021
Mask and method for fabricating the same
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations56