P

Inventor

LU CHI-TA

TW19 patents
⚠️ This page may combine multiple inventors who share the name “LU CHI-TA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

16 patents
US10877380B1Dec 29, 2020

Using inverse lithography technology in a method of mask data preparation for generating integrated circuit

TAIWAN SEMICONDUCTOR MFG CO LTD14 citations77
US11429019B2Aug 30, 2022

Method for manufacturing semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10866508B2Dec 15, 2020

Method for manufacturing photomask and semiconductor manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10784196B2Sep 22, 2020

Semiconductor structure and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations72
US11402743B2Aug 2, 2022

Mask defect prevention

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations71
US12293969B2May 6, 2025

Semiconductor structure and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12254258B2Mar 18, 2025

Critical dimension uniformity

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11763057B2Sep 19, 2023

Critical dimension uniformity

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11476193B2Oct 18, 2022

Semiconductor structure and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11055464B2Jul 6, 2021

Critical dimension uniformity

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12174529B2Dec 24, 2024

Method for manufacturing semiconductor device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US12124163B2Oct 22, 2024

Mask defect prevention

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11860530B2Jan 2, 2024

Mask defect prevention

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations60
US11900040B2Feb 13, 2024

Method and system for reducing layout distortion due to exposure non-uniformity

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations58
US11308254B2Apr 19, 2022

Method and system for reducing layout distortion due to exposure non-uniformity

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations58
US11209728B2Dec 28, 2021

Mask and method for fabricating the same

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations56

LU CHI-TA

3 patents