Inventor
MATYUSHKIN ALEXANDER
US23 patents
⚠️ This page may combine multiple inventors who share the name “MATYUSHKIN ALEXANDER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LAM RES CORP
12 patentsUS12387909B2Aug 12, 2025
Low frequency RF generator and associated electrostatic chuck
LAM RES CORP3 citations73
US11651991B2May 16, 2023
Electrostatic Chuck design for cooling-gas light-up prevention
LAM RES CORP2 citations73
US11069553B2Jul 20, 2021
Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformity
LAM RES CORP2 citations73
US11024532B2Jun 1, 2021
Electrostatic chuck design for cooling-gas light-up prevention
LAM RES CORP1 citations73
US10083853B2Sep 25, 2018
Electrostatic chuck design for cooling-gas light-up prevention
LAM RES CORP2 citations73
US10002782B2Jun 19, 2018
ESC assembly including an electrically conductive gasket for uniform RF power delivery therethrough
LAM RES CORP3 citations69
US12237201B2Feb 25, 2025
Electrostatic chucks with coolant gas zones and corresponding groove and monopolar electrostatic clamping electrode patterns
LAM RES CORP0 citations62
US12340989B2Jun 24, 2025
Electrostatic edge ring mounting system for substrate processing
LAM RES CORP0 citations59
US11942351B2Mar 26, 2024
Electrostatic chucks with coolant gas zones and corresponding groove and monopolar electrostatic clamping electrode patterns
LAM RES CORP0 citations59
US11664262B2May 30, 2023
Electrostatic chucks with coolant gas zones and corresponding groove and monopolar electrostatic clamping electrode patterns
LAM RES CORP0 citations59
US10804129B2Oct 13, 2020
Electrostatic chuck assembly incorporation a gasket for distributing RF power to a ceramic embedded electrode
LAM RES CORP0 citations52
US12381105B2Aug 5, 2025
Coolant channel with internal fins for substrate processing pedestals
LAM RES CORP0 citations47
APPLIED MATERIALS INC
8 patentsUS7264688B1Sep 4, 2007
Plasma reactor apparatus with independent capacitive and toroidal plasma sources
APPLIED MATERIALS INC73 citations97
US7780864B2Aug 24, 2010
Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution
APPLIED MATERIALS INC21 citations92
US7645357B2Jan 12, 2010
Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency
APPLIED MATERIALS INC40 citations92
US7436645B2Oct 14, 2008
Method and apparatus for controlling temperature of a substrate
APPLIED MATERIALS INC37 citations91
US10257887B2Apr 9, 2019
Substrate support assembly
APPLIED MATERIALS INC6 citations84
US9883549B2Jan 30, 2018
Substrate support assembly having rapid temperature control
APPLIED MATERIALS INC6 citations84
US7727413B2Jun 1, 2010
Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density
APPLIED MATERIALS INC5 citations62
US7846254B2Dec 7, 2010
Heat transfer assembly
APPLIED MATERIALS INC1 citations42
MATYUSHKIN ALEXANDER
3 patentsUS8226769B2Jul 24, 2012
Substrate support with electrostatic chuck having dual temperature zones
MATYUSHKIN ALEXANDER80 citations96
US9275887B2Mar 1, 2016
Substrate processing with rapid temperature gradient control
MATYUSHKIN ALEXANDER20 citations92
US8663391B2Mar 4, 2014
Electrostatic chuck having a plurality of heater coils
MATYUSHKIN ALEXANDER35 citations92