Inventor
LOOPSTRA ERIK R
NL28 patents
⚠️ This page may combine multiple inventors who share the name “LOOPSTRA ERIK R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
15 patentsUS6555834B1Apr 29, 2003
Gas flushing system for use in lithographic apparatus
ASML NETHERLANDS BV50 citations96
US6674510B1Jan 6, 2004
Off-axis levelling in lithographic projection apparatus
ASML NETHERLANDS BV192 citations95
US6879063B2Apr 12, 2005
Displacement device
ASML NETHERLANDS BV50 citations94
US6710353B1Mar 23, 2004
Actuator and transducer
ASML NETHERLANDS BV17 citations92
US6542220B1Apr 1, 2003
Purge gas systems for use in lithographic projection apparatus
ASML NETHERLANDS BV92 citations92
US7019815B2Mar 28, 2006
Off-axis leveling in lithographic projection apparatus
ASML NETHERLANDS BV19 citations89
US6593585B1Jul 15, 2003
Lithographic projection apparatus with positioning system for use with reflectors
ASML NETHERLANDS BV26 citations89
US6509951B2Jan 21, 2003
Lithographic projection apparatus having a temperature controlled heat shield
ASML NETHERLANDS BV31 citations86
US6987278B2Jan 17, 2006
Gas flushing system with recovery system for use in lithographic apparatus
ASML NETHERLANDS BV14 citations84
US6894261B2May 17, 2005
Position measuring system for use in lithographic apparatus
ASML NETHERLANDS BV12 citations79
US6875992B2Apr 5, 2005
Position measuring device, position measuring system, lithographic apparatus, and device manufacturing method
ASML NETHERLANDS BV15 citations79
US6721389B2Apr 13, 2004
Lithographic apparatus, device manufacturing method, and device manufactured thereby
ASML NETHERLANDS BV8 citations70
US6730920B2May 4, 2004
Abbe arm calibration system for use in lithographic apparatus
ASML NETHERLANDS BV10 citations65
US6791443B2Sep 14, 2004
Actuator and transducer
ASML NETHERLANDS BV2 citations63
US6765218B2Jul 20, 2004
Lithographic projection apparatus with positioning system for use with reflectors
ASML NETHERLANDS BV0 citations49
ASM LITHOGRAPHY BV
5 patentsUS6208407B1Mar 27, 2001
Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
ASM LITHOGRAPHY BV1,029 citations99
US6020964AFeb 1, 2000
Interferometer system and lithograph apparatus including an interferometer system
ASM LITHOGRAPHY BV478 citations99
US6262796B1Jul 17, 2001
Positioning device having two object holders
ASM LITHOGRAPHY BV634 citations96
US5969441AOct 19, 1999
Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
ASM LITHOGRAPHY BV1,609 citations95
US6054784AApr 25, 2000
Positioning device having three coil systems mutually enclosing angles of 120° and lithographic device comprising such a positioning device
ASM LITHOGRAPHY BV43 citations90
ASML HOLDING NV
4 patentsUS6906783B2Jun 14, 2005
System for using a two part cover for protecting a reticle
ASML HOLDING NV79 citations95
US7209220B2Apr 24, 2007
System for using a two part cover for and a box for protecting a reticle
ASML HOLDING NV37 citations93
US7304720B2Dec 4, 2007
System for using a two part cover for protecting a reticle
ASML HOLDING NV28 citations90
US7830497B2Nov 9, 2010
System and method for using a two part cover and a box for protecting a reticle
ASML HOLDING NV10 citations82