Inventor
FUJINO NAOHIKO
JP17 patents
⚠️ This page may combine multiple inventors who share the name “FUJINO NAOHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MITSUBISHI ELECTRIC CORP
12 patentsUS5650614AJul 22, 1997
Optical scanning system utilizing an atomic force microscope and an optical microscope
MITSUBISHI ELECTRIC CORP66 citations96
US5715052AFeb 3, 1998
Method of detecting the position and the content of fine foreign matter on substrates and analyzers used therefor
MITSUBISHI ELECTRIC CORP58 citations95
US6110291AAug 29, 2000
Thin film forming apparatus using laser
MITSUBISHI ELECTRIC CORP67 citations94
US5517027AMay 14, 1996
Method for detecting and examining slightly irregular surface states, scanning probe microscope therefor, and method for fabricating a semiconductor device or a liquid crystal display device using these
MITSUBISHI ELECTRIC CORP55 citations94
US5877035AMar 2, 1999
Analyzing method and apparatus for minute foreign substances, and manufacturing methods for manufacturing semiconductor device and liquid crystal display device using the same
MITSUBISHI ELECTRIC CORP29 citations92
US5568821AOct 29, 1996
Semiconductor cleaning apparatus and wafer cassette
MITSUBISHI ELECTRIC CORP21 citations92
US5445171AAug 29, 1995
Semiconductor cleaning apparatus and wafer cassette
MITSUBISHI ELECTRIC CORP27 citations92
US6355495B1Mar 12, 2002
Method and apparatus for analyzing minute foreign substance, and process for semiconductor elements or liquid crystal elements by use thereof
MITSUBISHI ELECTRIC CORP27 citations90
US6182675B1Feb 6, 2001
Apparatus for recovering impurities from a silicon wafer
MITSUBISHI ELECTRIC CORP26 citations89
US5907398AMay 25, 1999
Particle detecting method and system for detecting minute particles on a workpiece
MITSUBISHI ELECTRIC CORP14 citations74
US5590672AJan 7, 1997
Semiconductor cleaning apparatus and wafer cassette
MITSUBISHI ELECTRIC CORP9 citations73
US5551459ASep 3, 1996
Semiconductor cleaning apparatus and wafer cassette
MITSUBISHI ELECTRIC CORP10 citations73
SEIKO INSTR INC
5 patentsUS6259093B1Jul 10, 2001
Surface analyzing apparatus
SEIKO INSTR INC21 citations92
US6255127B1Jul 3, 2001
Analyzing method and apparatus for minute foreign substances, and manufacturing methods for manufacturing semiconductor device and liquid crystal display device using the same
SEIKO INSTR INC20 citations92
US6124142ASep 26, 2000
Method for analyzing minute foreign substance elements
SEIKO INSTR INC27 citations92
US6184519B1Feb 6, 2001
Surface analyzing apparatus with anti-vibration table
SEIKO INSTR INC8 citations73
US6388249B2May 14, 2002
Surface analyzing apparatus
SEIKO INSTR INC3 citations62