Inventor
IHARA HISANORI
JP40 patents
⚠️ This page may combine multiple inventors who share the name “IHARA HISANORI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
23 patentsUS5527417AJun 18, 1996
Photo-assisted CVD apparatus
TOSHIBA KK807 citations99
US6690423B1Feb 10, 2004
Solid-state image pickup apparatus
TOSHIBA KK142 citations98
US6674470B1Jan 6, 2004
MOS-type solid state imaging device with high sensitivity
TOSHIBA KK124 citations98
US6211509B1Apr 3, 2001
Solid-state image sensor
TOSHIBA KK98 citations98
US6072206AJun 6, 2000
Solid state image sensor
TOSHIBA KK56 citations96
US6344670B2Feb 5, 2002
Solid-state sensor and system
TOSHIBA KK15 citations93
US6271554B1Aug 7, 2001
Solid-state image sensor having a substrate with an impurity concentration gradient
TOSHIBA KK30 citations93
US7855406B2Dec 21, 2010
Solid-state imaging device and method of manufacturing the same
TOSHIBA KK22 citations92
US7042061B2May 9, 2006
Solid-state image pickup apparatus
TOSHIBA KK20 citations92
US6521925B1Feb 18, 2003
Solid-state image sensor
TOSHIBA KK52 citations92
US6344666B1Feb 5, 2002
Amplifier-type solid-state image sensor device
TOSHIBA KK46 citations92
US7259412B2Aug 21, 2007
Solid state imaging device
TOSHIBA KK13 citations83
US7385270B2Jun 10, 2008
Semiconductor device and manufacturing method thereof
TOSHIBA KK8 citations74
US6441411B2Aug 27, 2002
Solid-state image sensor having a substrate with an impurity concentration gradient
TOSHIBA KK9 citations74
US6194244B1Feb 27, 2001
Method of manufacturing a photodiode in a solid-state device
TOSHIBA KK14 citations74
US5378541AJan 3, 1995
Silicon thin film member
TOSHIBA KK14 citations74
US7224003B2May 29, 2007
Solid-state image pickup apparatus
TOSHIBA KK8 citations73
US7889255B2Feb 15, 2011
Solid-state imaging device comprising a signal storage section including a highly doped area
TOSHIBA KK5 citations63
US7709870B2May 4, 2010
CMOS (complementary metal oxide semiconductor) type solid-state image pickup device using N/P+ substrate in which N-type semiconductor layer is laminated on P+ type substrate main body
TOSHIBA KK6 citations63
US7696547B2Apr 13, 2010
Semiconductor device with burried semiconductor regions
TOSHIBA KK3 citations63
US7554141B2Jun 30, 2009
Solid-state image pickup device and method of manufacturing the same
TOSHIBA KK6 citations63
US7176507B2Feb 13, 2007
Solid state image sensing device and method of manufacturing the same
TOSHIBA KK5 citations63
US5484658AJan 16, 1996
Silicon thin film member
TOSHIBA KK3 citations63
SAMSUNG ELECTRONICS CO LTD
12 patentsUS10199423B2Feb 5, 2019
CMOS image sensors including a vertical source follower gate
SAMSUNG ELECTRONICS CO LTD9 citations84
US10181492B2Jan 15, 2019
Complementary metal-oxide-semiconductor image sensors
SAMSUNG ELECTRONICS CO LTD4 citations84
US9025063B2May 5, 2015
Unit pixel of image sensor and pixel array including the unit pixel
SAMSUNG ELECTRONICS CO LTD12 citations84
US10950650B2Mar 16, 2021
Complementary metal-oxide-semiconductor image sensors
SAMSUNG ELECTRONICS CO LTD2 citations73
US10424611B2Sep 24, 2019
Image sensor including first and second overlapping device isolation patterns
SAMSUNG ELECTRONICS CO LTD3 citations73
US10192910B2Jan 29, 2019
Image sensor
SAMSUNG ELECTRONICS CO LTD3 citations73
US9337224B2May 10, 2016
CMOS image sensor and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD5 citations73
US11495633B2Nov 8, 2022
Complementary metal-oxide-semiconductor image sensors
SAMSUNG ELECTRONICS CO LTD0 citations62
US10658413B2May 19, 2020
Semiconductor device including via plug
SAMSUNG ELECTRONICS CO LTD1 citations60
US10615216B2Apr 7, 2020
Complementary metal-oxide-semiconductor image sensors
SAMSUNG ELECTRONICS CO LTD0 citations52
US9793310B2Oct 17, 2017
Image sensor devices using offset pixel patterns
SAMSUNG ELECTRONICS CO LTD1 citations52
US9318521B2Apr 19, 2016
Image sensor
SAMSUNG ELECTRONICS CO LTD1 citations52
IHARA HISANORI
5 patentsUS9305947B2Apr 5, 2016
Image sensors having deep trenches including negative charge material
IHARA HISANORI17 citations92
US8716769B2May 6, 2014
Image sensors including color adjustment path
IHARA HISANORI29 citations92
US9564463B2Feb 7, 2017
Methods of fabricating image sensors having deep trenches including negative charge material
IHARA HISANORI11 citations83
US8987751B2Mar 24, 2015
Photodiode device based on wide bandgap material layer and back-side illumination (BSI) CMOS image sensor and solar cell including the photodiode device
IHARA HISANORI14 citations83
US8653436B2Feb 18, 2014
CMOS pixel including a transfer gate overlapping the photosensitive region
IHARA HISANORI0 citations51