Inventor
FU TAO-YI
US30 patents
⚠️ This page may combine multiple inventors who share the name “FU TAO-YI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
14 patentsUS6363166B1Mar 26, 2002
Automated photomask inspection apparatus
KLA TENCOR CORP94 citations97
US6052478AApr 18, 2000
Automated photomask inspection apparatus
KLA TENCOR CORP166 citations97
US6867406B1Mar 15, 2005
Confocal wafer inspection method and apparatus using fly lens arrangement
KLA TENCOR CORP43 citations96
US6816249B2Nov 9, 2004
High throughput brightfield/darkfield wafer inspection system using advanced optical techniques
KLA TENCOR CORP49 citations96
US7554655B2Jun 30, 2009
High throughput brightfield/darkfield water inspection system using advanced optical techniques
KLA TENCOR CORP16 citations92
US7109458B2Sep 19, 2006
Confocal wafer depth scanning inspection method
KLA TENCOR CORP15 citations92
US7858911B2Dec 28, 2010
Confocal wafer inspection system and method
KLA TENCOR CORP15 citations89
US7379173B2May 27, 2008
High throughput brightfield/darkfield wafer inspection system using advanced optical techniques
KLA TENCOR CORP9 citations84
US7399950B2Jul 15, 2008
Confocal wafer inspection method and apparatus using fly lens arrangement
KLA TENCOR CORP6 citations74
US6584218B2Jun 24, 2003
Automated photomask inspection apparatus
KLA TENCOR CORP8 citations72
US10324046B1Jun 18, 2019
Methods and systems for monitoring a non-defect related characteristic of a patterned wafer
KLA TENCOR CORP5 citations68
US7522275B2Apr 21, 2009
High throughput darkfield/brightfield wafer inspection system using advanced optical techniques
KLA TENCOR CORP1 citations63
US7259844B2Aug 21, 2007
High throughput darkfield/brightfield wafer inspection system using advanced optical techniques
KLA TENCOR CORP2 citations63
US9151718B2Oct 6, 2015
Illumination system with time multiplexed sources for reticle inspection
KLA TENCOR CORP0 citations51
KLA TENCOR TECH CORP
12 patentsUS6288780B1Sep 11, 2001
High throughput brightfield/darkfield wafer inspection system using advanced optical techniques
KLA TENCOR TECH CORP207 citations99
US7061625B1Jun 13, 2006
Method and apparatus using interferometric metrology for high aspect ratio inspection
KLA TENCOR TECH CORP85 citations97
US7209239B2Apr 24, 2007
System and method for coherent optical inspection
KLA TENCOR TECH CORP16 citations92
US7164475B2Jan 16, 2007
High throughput brightfield/darkfield wafer inspection system using advanced optical techniques
KLA TENCOR TECH CORP17 citations92
US7436503B1Oct 14, 2008
Dark field inspection apparatus and methods
KLA TENCOR TECH CORP35 citations89
US7924434B2Apr 12, 2011
Systems configured to generate output corresponding to defects on a specimen
KLA TENCOR TECH CORP8 citations83
US7535563B1May 19, 2009
Systems configured to inspect a specimen
KLA TENCOR TECH CORP11 citations83
US7327464B2Feb 5, 2008
System and method for coherent optical inspection
KLA TENCOR TECH CORP7 citations73
US7738089B2Jun 15, 2010
Methods and systems for inspection of a specimen using different inspection parameters
KLA TENCOR TECH CORP7 citations71
US8355140B2Jan 15, 2013
Systems configured to generate output corresponding to defects on a specimen
KLA TENCOR TECH CORP3 citations62
US7317527B1Jan 8, 2008
Spatial light modulator fourier transform
KLA TENCOR TECH CORP3 citations60
US8384887B2Feb 26, 2013
Methods and systems for inspection of a specimen using different inspection parameters
KLA TENCOR TECH CORP1 citations49